Hideo Nakagawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 10,040,220
- Issue date Aug 7, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Inorganic material film, photomask blank, and method for manufactur...
- Patent number 9,851,633
- Issue date Dec 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank manufacturing method, photomask blank, photomask, a...
- Patent number 9,689,066
- Issue date Jun 27, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank
- Patent number 9,541,823
- Issue date Jan 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 9,488,907
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 9,440,375
- Issue date Sep 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,268,212
- Issue date Feb 23, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and method for...
- Patent number 9,188,852
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half-tone phase shift mask blank and method for manufacturing half-...
- Patent number 9,158,192
- Issue date Oct 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Power supply device and control method for power supply
- Patent number 9,048,687
- Issue date Jun 2, 2015
- Ricoh Company, Limited
- Mikio Nakajima
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 8,968,972
- Issue date Mar 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 8,709,686
- Issue date Apr 29, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 8,486,832
- Issue date Jul 16, 2013
- Panasonic Corporation
- Yasunori Morinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 8,017,518
- Issue date Sep 13, 2011
- Panasonic Corporation
- Yasunori Morinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, semiconductor and fabricating method for the same
- Patent number 7,985,691
- Issue date Jul 26, 2011
- Panasonic Corporation
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for preparing a dispersion liquid of zeolite fine particles
- Patent number 7,923,522
- Issue date Apr 12, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching method, fine structure formation method, mold and mold...
- Patent number 7,919,005
- Issue date Apr 5, 2011
- Panasonic Corporation
- Hideo Nakagawa
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Dry etching method, fine structure formation method, mold and mold...
- Patent number 7,906,030
- Issue date Mar 15, 2011
- Panasonic Corporation
- Hideo Nakagawa
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,893,535
- Issue date Feb 22, 2011
- Panasonic Corporation
- Atsushi Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film with low dielectric constant
- Patent number 7,786,022
- Issue date Aug 31, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dry etching method, fine structure formation method, mold and mold...
- Patent number 7,758,761
- Issue date Jul 20, 2010
- Panasonic Corporation
- Hideo Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organic silicon oxide core-shell particles and preparation method t...
- Patent number 7,754,330
- Issue date Jul 13, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method, fine structure formation method, mold and mold...
- Patent number 7,731,862
- Issue date Jun 8, 2010
- Panasonic Corporation
- Hideo Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, semiconductor and fabricating method for the same
- Patent number 7,732,339
- Issue date Jun 8, 2010
- Panasonic Corporation
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,663,239
- Issue date Feb 16, 2010
- Panasonic Corporation
- Atsushi Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including a barrier metal film
- Patent number 7,659,626
- Issue date Feb 9, 2010
- Panasonic Corporation
- Hideo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method and method for forming semiconductor device
- Patent number 7,563,709
- Issue date Jul 21, 2009
- Panasonic Corporation
- Hideo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming insulating film with low dielectric constant,...
- Patent number 7,563,706
- Issue date Jul 21, 2009
- Panasonic Corporation
- Hideo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device comprising porous film
- Patent number 7,405,459
- Issue date Jul 29, 2008
- Shin-Etsu Chemical Co. Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous-film-forming composition, preparation method of the composit...
- Patent number 7,402,621
- Issue date Jul 22, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL
- Publication number 20240327578
- Publication date Oct 3, 2024
- Osaka University
- Yoshinori Takashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYSILOXANE COMPOSITION, ADHESIVE, METHOD FOR PRODUCING POLYSILOXA...
- Publication number 20240191036
- Publication date Jun 13, 2024
- Kagoshima University
- Yoshiro KANEKO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MICROSTRUCTURE-TRANSFER STAMP COMPONENT
- Publication number 20240047243
- Publication date Feb 8, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hideo NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A LIGHT EMITTING DIODE SUPPLY SUBSTRATE, METHO...
- Publication number 20230387084
- Publication date Nov 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hideo NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...
- Publication number 20170003584
- Publication date Jan 5, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20160346960
- Publication date Dec 1, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CONTAINER FOR STORING PHOTOMASK BLANKS
- Publication number 20160216603
- Publication date Jul 28, 2016
- Shin-Etsu Polymer Co., Ltd.
- Tsutomu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...
- Publication number 20150192849
- Publication date Jul 9, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...
- Publication number 20150159264
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK
- Publication number 20150160549
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20130306596
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20130309600
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK MANUFACTURING METHOD, PHOTOMASK BLANK, PHOTOMASK, A...
- Publication number 20130309599
- Publication date Nov 21, 2013
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...
- Publication number 20130309598
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...
- Publication number 20130309601
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...
- Publication number 20130230796
- Publication date Sep 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
POWER SUPPLY DEVICE AND CONTROL METHOD FOR POWER SUPPLY
- Publication number 20130099573
- Publication date Apr 25, 2013
- Mikio Nakajima
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONST...
- Publication number 20100283133
- Publication date Nov 11, 2010
- Yoshitaka Hamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic silicon oxide fine particles and preparation method thereof...
- Publication number 20100233482
- Publication date Sep 16, 2010
- Yoshitaka Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SEMICONDUCTOR AND FABRICATING METHOD FOR THE SAME
- Publication number 20100203733
- Publication date Aug 12, 2010
- PANASONIC CORPORATION
- Kenshi Kanegae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20100102449
- Publication date Apr 29, 2010
- PANASONIC CORPORATION
- Atsushi IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF,...
- Publication number 20090294922
- Publication date Dec 3, 2009
- Yoshitaka Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF...
- Publication number 20090294726
- Publication date Dec 3, 2009
- Yoshitaka Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20090170314
- Publication date Jul 2, 2009
- Yasunori Morinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20090042403
- Publication date Feb 12, 2009
- Matsushita Electric Industrial Co., Ltd.
- Nobuo Aoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method, fine structure formation method, mold and mold...
- Publication number 20090017259
- Publication date Jan 15, 2009
- Hideo Nakagawa
- G02 - OPTICS
Information Patent Application
Dry etching method, fine structure formation method, mold and mold...
- Publication number 20090011065
- Publication date Jan 8, 2009
- Hideo Nakagawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SILOXANE POLYMER, PREPARATION METHOD THEREOF, POROUS-FILM FORMING C...
- Publication number 20080292863
- Publication date Nov 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Fujio Yagihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONST...
- Publication number 20080290521
- Publication date Nov 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR INTERLAYER-INSULATING FILM FORMING COMPOSITION, PREPA...
- Publication number 20080290472
- Publication date Nov 27, 2008
- Shin-Etsu Chemical Co., Ltd.
- Fujio Yagihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hideo Nakagawa

Person

Patents Grantslast 30 patents

Blank for mold production and method for manufacturing mold

Inorganic material film, photomask blank, and method for manufactur...

Photomask blank manufacturing method, photomask blank, photomask, a...

Photomask blank

Photomask blank, process for production of photomask, and chromium-...

Blank for mold production and method for manufacturing mold

Photomask blank and method for manufacturing photomask

Photomask blank, method for manufacturing photomask, and method for...

Half-tone phase shift mask blank and method for manufacturing half-...

Power supply device and control method for power supply

Photomask blank, process for production of photomask, and chromium-...

Photomask blank, process for production of photomask, and chromium-...

Method for fabricating semiconductor device

Method for manufacturing a semiconductor device

Etching method, semiconductor and fabricating method for the same

Process for preparing a dispersion liquid of zeolite fine particles

Dry etching method, fine structure formation method, mold and mold...

Dry etching method, fine structure formation method, mold and mold...

Semiconductor device and method for fabricating the same

Method for forming insulating film with low dielectric constant

Dry etching method, fine structure formation method, mold and mold...

Organic silicon oxide core-shell particles and preparation method t...

Dry etching method, fine structure formation method, mold and mold...

Etching method, semiconductor and fabricating method for the same

Semiconductor device and method for fabricating the same

Semiconductor device including a barrier metal film

Pattern formation method and method for forming semiconductor device

Material for forming insulating film with low dielectric constant,...

Semiconductor device comprising porous film

Porous-film-forming composition, preparation method of the composit...

Patents Applicationslast 30 patents

SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL

POLYSILOXANE COMPOSITION, ADHESIVE, METHOD FOR PRODUCING POLYSILOXA...

MICROSTRUCTURE-TRANSFER STAMP COMPONENT

METHOD FOR PRODUCING A LIGHT EMITTING DIODE SUPPLY SUBSTRATE, METHO...

INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

CONTAINER FOR STORING PHOTOMASK BLANKS

PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...

SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...

PHOTOMASK BLANK

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

PHOTOMASK BLANK MANUFACTURING METHOD, PHOTOMASK BLANK, PHOTOMASK, A...

HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...

PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...

POWER SUPPLY DEVICE AND CONTROL METHOD FOR POWER SUPPLY

FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONST...

Organic silicon oxide fine particles and preparation method thereof...

ETCHING METHOD, SEMICONDUCTOR AND FABRICATING METHOD FOR THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF,...

ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF...

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

Dry etching method, fine structure formation method, mold and mold...

Dry etching method, fine structure formation method, mold and mold...

SILOXANE POLYMER, PREPARATION METHOD THEREOF, POROUS-FILM FORMING C...

FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONST...

SEMICONDUCTOR INTERLAYER-INSULATING FILM FORMING COMPOSITION, PREPA...