Hideo Nakamura

Person

Amagasaki-City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, method for manufacturing semiconductor device,...
- Patent number 12,119,219
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor film forming method using hydrazine-based compound gas
- Patent number 11,348,794
- Issue date May 31, 2022
- Tokyo Electron Limited
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 10,864,548
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,882,962
- Issue date Nov 11, 2014
- Tokyo Electron Limited
- Jun Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,852,389
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Taichi Monden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming silicon oxide film
- Patent number 8,389,420
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20220157600
- Publication date May 19, 2022
- Tokyo Electron Limited
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-Forming Method and Film-Forming Apparatus
- Publication number 20200056287
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20190378723
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20180311700
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Hiroaki Ashizawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20180112312
- Publication date Apr 26, 2018
- TOKYO ELECTRON LIMITED
- Masaya ODAGIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PLASMA NITRIDING METHOD AND PLASMA NITRIDING APPARATUS
- Publication number 20120184111
- Publication date Jul 19, 2012
- TOKYO ELECTRON LIMITED
- Taichi Monden
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND...
- Publication number 20120094505
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120067845
- Publication date Mar 22, 2012
- TOKYO ELECTRON LIMITED
- Taichi Monden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110174441
- Publication date Jul 21, 2011
- TOKYO ELECTRON LIMITED
- Jun YAMASHITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM
- Publication number 20110171835
- Publication date Jul 14, 2011
- TOKYO ELECTRON LIMITED
- Yoshiro KABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110024048
- Publication date Feb 3, 2011
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming silicon oxide film, storage medium, and plasma p...
- Publication number 20110017586
- Publication date Jan 27, 2011
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS

Hideo Nakamura

Person

Patents Grantslast 30 patents

Film forming method, method for manufacturing semiconductor device,...

Semiconductor film forming method using hydrazine-based compound gas

Film forming method and film forming apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Method and apparatus for forming silicon oxide film

Patents Applicationslast 30 patents

FILM FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE,...

Film-Forming Method and Film-Forming Apparatus

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING APPARATUS AND FILM FORMING METHOD

SELECTIVE PLASMA NITRIDING METHOD AND PLASMA NITRIDING APPARATUS

METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM

PLASMA PROCESSING APPARATUS

Method for forming silicon oxide film, storage medium, and plasma p...