Hideo Namatsu

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern forming method, supercritical processing solution fo...
- Patent number 8,026,047
- Issue date Sep 27, 2011
- Nippon Telegraph and Telephone Corporation
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method
- Patent number 7,977,036
- Issue date Jul 12, 2011
- Nippon Telegraph and Telephone Corporation
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Supercritical drying method and supercritical drying apparatus
- Patent number 6,576,066
- Issue date Jun 10, 2003
- Nippon Telegraph and Telephone Corporation
- Hideo Namatsu
- F26 - DRYING
Information Patent Grant
Pattern formation method and apparatus
- Patent number 6,554,507
- Issue date Apr 29, 2003
- Nippon Telegraph and Telephone Corporation
- Hideo Namatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method and apparatus
- Patent number 6,358,673
- Issue date Mar 19, 2002
- Nippon Telegraph and Telephone Corporation
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method of farbricating the same
- Patent number 5,811,872
- Issue date Sep 22, 1998
- Nippon Telegraph and Telephone Corporation
- Katsuyuki Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device with water protective film
- Patent number 5,512,513
- Issue date Apr 30, 1996
- Nippon Telegraph & Telephone Corporation
- Katsuyuki Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 5,376,590
- Issue date Dec 27, 1994
- Nippon Telegraph & Telephone Corporation
- Katsuyuki Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intermediate layer material of three-layer resist system
- Patent number 4,738,916
- Issue date Apr 19, 1988
- Nippon Telegraph and Telephone Corp.
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intermediate layer material of three-layer resist system and method...
- Patent number 4,615,782
- Issue date Oct 7, 1986
- Nippon Telegraph & Telephone Corporation
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Resist Pattern Forming Method, Supercritical Processing Solution Fo...
- Publication number 20080124648
- Publication date May 29, 2008
- NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Pattern Forming Method
- Publication number 20080118871
- Publication date May 22, 2008
- NIPPON TELEGRAPH AND TELEPHONE CORPORATION
- Hideo Namatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern formation method and apparatus
- Publication number 20020132192
- Publication date Sep 19, 2002
- Hideo Namatsu
- H01 - BASIC ELECTRIC ELEMENTS

Hideo Namatsu

Person

Patents Grantslast 30 patents

Resist pattern forming method, supercritical processing solution fo...

Resist pattern forming method

Supercritical drying method and supercritical drying apparatus

Pattern formation method and apparatus

Pattern formation method and apparatus

Semiconductor device and method of farbricating the same

Method of fabricating semiconductor device with water protective film

Semiconductor device and method of fabricating the same

Intermediate layer material of three-layer resist system

Intermediate layer material of three-layer resist system and method...

Patents Applicationslast 30 patents

Resist Pattern Forming Method, Supercritical Processing Solution Fo...

Resist Pattern Forming Method

Pattern formation method and apparatus