Hideo Todokoro

Person

Nishitama-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 10,903,037
- Issue date Jan 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample electrification measurement method and charged particle beam...
- Patent number 8,835,844
- Issue date Sep 16, 2014
- Hitachi, Ltd.
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus, and method of controlling the same
- Patent number 8,772,735
- Issue date Jul 8, 2014
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 8,604,430
- Issue date Dec 10, 2013
- Hitachi, Ltd.
- Yuko Iwabuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and method of controlling the same
- Patent number 8,319,193
- Issue date Nov 27, 2012
- Hitachi High-Technologies Corporation
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of an inspection system using an electron beam
- Patent number 8,134,125
- Issue date Mar 13, 2012
- Hitachi, Ltd.
- Yuko Iwabuchi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for wafer pattern inspection
- Patent number 7,982,188
- Issue date Jul 19, 2011
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,977,632
- Issue date Jul 12, 2011
- Hitachi, Ltd.
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus for forming a specimen image
- Patent number 7,956,324
- Issue date Jun 7, 2011
- Hitachi High-Technologies Corporation
- Noritsugu Takahashi
- G01 - MEASURING TESTING
Information Patent Grant
Monochromator and scanning electron microscope using the same
- Patent number 7,838,827
- Issue date Nov 23, 2010
- Hitachi High-Technologies Corporation
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with aberration corrector
- Patent number 7,825,377
- Issue date Nov 2, 2010
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Image evaluation method and microscope
- Patent number 7,805,023
- Issue date Sep 28, 2010
- Hitachi, Ltd.
- Tohru Ishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a sample image and charged particle beam apparatus
- Patent number 7,800,059
- Issue date Sep 21, 2010
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- G01 - MEASURING TESTING
Information Patent Grant
Sample electrification measurement method and charged particle beam...
- Patent number 7,700,918
- Issue date Apr 20, 2010
- Hitachi, Ltd.
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Grant
Charge control apparatus and measurement apparatus equipped with th...
- Patent number 7,683,319
- Issue date Mar 23, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,642,514
- Issue date Jan 5, 2010
- Hitachi, Ltd.
- Atsushi Takane
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam apparatus
- Patent number 7,491,933
- Issue date Feb 17, 2009
- Hitachi, Ltd.
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,442,923
- Issue date Oct 28, 2008
- Hitachi, Ltd.
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 7,439,506
- Issue date Oct 21, 2008
- Hitachi, Ltd.
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection system, inspection method, and process management method
- Patent number 7,411,190
- Issue date Aug 12, 2008
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and charged particle beam irradiati...
- Patent number 7,408,172
- Issue date Aug 5, 2008
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,399,966
- Issue date Jul 15, 2008
- Hitachi, Ltd.
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope and electron beam inspection system
- Patent number 7,394,066
- Issue date Jul 1, 2008
- Hitachi High-Technologies Corporation
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and scanning electron microscope for measuring width of mate...
- Patent number 7,385,196
- Issue date Jun 10, 2008
- Hitachi High-Technologies Corporation
- Goroku Shimoma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with aberration corrector
- Patent number 7,375,323
- Issue date May 20, 2008
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample electrification measurement method and charged particle beam...
- Patent number 7,372,028
- Issue date May 13, 2008
- Hitachi, Ltd.
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming a sample image and charged particle beam apparatus
- Patent number 7,361,894
- Issue date Apr 22, 2008
- Hitachi High-Technologies Corporation
- Mitsugu Sato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image evaluation method and microscope
- Patent number 7,340,111
- Issue date Mar 4, 2008
- Hitachi, Ltd.
- Tohru Ishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,329,868
- Issue date Feb 12, 2008
- Hitachi, Ltd.
- Atsushi Takane
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Monochromator and scanning electron microscope using the same
- Patent number 7,315,024
- Issue date Jan 1, 2008
- Hitachi High-Technologies Corporation
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200090897
- Publication date Mar 19, 2020
- Hitachi High-Technologies Corporation
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20130063029
- Publication date Mar 14, 2013
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...
- Publication number 20120132801
- Publication date May 31, 2012
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20110089336
- Publication date Apr 21, 2011
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Electrification Measurement Method and Charged Particle Beam...
- Publication number 20100294929
- Publication date Nov 25, 2010
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Application
Charge control apparatus and measurement apparatus equipped with th...
- Publication number 20090166557
- Publication date Jul 2, 2009
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM
- Publication number 20090057556
- Publication date Mar 5, 2009
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20090039259
- Publication date Feb 12, 2009
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus with aberration corrector
- Publication number 20090008551
- Publication date Jan 8, 2009
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam apparatus
- Publication number 20080302962
- Publication date Dec 11, 2008
- Hitachi High-Technologies Corporation
- Noritsugu Takahashi
- G01 - MEASURING TESTING
Information Patent Application
Electron Microscope And Electron Beam Inspection System
- Publication number 20080265161
- Publication date Oct 30, 2008
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monochromator and scanning electron microscope using the same
- Publication number 20080237463
- Publication date Oct 2, 2008
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a sample image and charged particle beam apparatus
- Publication number 20080217535
- Publication date Sep 11, 2008
- Mitsugu Sato
- G01 - MEASURING TESTING
Information Patent Application
Sample electrification measurement method and charged particle beam...
- Publication number 20080201091
- Publication date Aug 21, 2008
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20080116376
- Publication date May 22, 2008
- Hitachi, Ltd
- Atsushi Takane
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CHARGED PARTICLE BEAM IRRADIATI...
- Publication number 20080042074
- Publication date Feb 21, 2008
- Mitsugu Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Image evaluation method and microscope
- Publication number 20070280559
- Publication date Dec 6, 2007
- Tohru Ishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning electron microscope
- Publication number 20070221846
- Publication date Sep 27, 2007
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20070215803
- Publication date Sep 20, 2007
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron microscope and electron bean inspection system.
- Publication number 20070181808
- Publication date Aug 9, 2007
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus with aberration corrector
- Publication number 20070114409
- Publication date May 24, 2007
- Hitachi High-Technologies Corporation
- Takeshi Kawasaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of forming a sample image and charged particle beam apparatus
- Publication number 20070029478
- Publication date Feb 8, 2007
- Mitsugu Sato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20070023657
- Publication date Feb 1, 2007
- Hitachi, Ltd
- Atsushi Takane
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and method for wafer pattern inspection
- Publication number 20060249676
- Publication date Nov 9, 2006
- Hitachi High-Technologies Corp.
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system, inspection method, and process management method
- Publication number 20060231758
- Publication date Oct 19, 2006
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Application
Monochromator and scanning electron microscope using the same
- Publication number 20060219910
- Publication date Oct 5, 2006
- Yoichi Ose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample electrification measurement method and charged particle beam...
- Publication number 20060219918
- Publication date Oct 5, 2006
- Makoto Ezumi
- G01 - MEASURING TESTING
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20060151699
- Publication date Jul 13, 2006
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Scanning electron microscope
- Publication number 20060113474
- Publication date Jun 1, 2006
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Application
Scanning electron microscope
- Publication number 20060071167
- Publication date Apr 6, 2006
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS

Hideo Todokoro

Person

Patents Grantslast 30 patents

Charged particle beam device

Sample electrification measurement method and charged particle beam...

Charged particle beam apparatus, and method of controlling the same

Method and an apparatus of an inspection system using an electron beam

Charged particle beam apparatus, and method of controlling the same

Method and apparatus of an inspection system using an electron beam

Apparatus and method for wafer pattern inspection

Scanning electron microscope

Charged particle beam apparatus for forming a specimen image

Monochromator and scanning electron microscope using the same

Electron beam apparatus with aberration corrector

Image evaluation method and microscope

Method of forming a sample image and charged particle beam apparatus

Sample electrification measurement method and charged particle beam...

Charge control apparatus and measurement apparatus equipped with th...

Charged particle beam apparatus

Electron beam apparatus

Scanning electron microscope

Method and an apparatus of an inspection system using an electron beam

Inspection system, inspection method, and process management method

Charged particle beam apparatus and charged particle beam irradiati...

Scanning electron microscope

Electron microscope and electron beam inspection system

Method and scanning electron microscope for measuring width of mate...

Electron beam apparatus with aberration corrector

Sample electrification measurement method and charged particle beam...

Method of forming a sample image and charged particle beam apparatus

Image evaluation method and microscope

Charged particle beam apparatus

Monochromator and scanning electron microscope using the same

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

Sample Electrification Measurement Method and Charged Particle Beam...

Charge control apparatus and measurement apparatus equipped with th...

METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM

SCANNING ELECTRON MICROSCOPE

Electron beam apparatus with aberration corrector

Charged particle beam apparatus

Electron Microscope And Electron Beam Inspection System

Monochromator and scanning electron microscope using the same

Method of forming a sample image and charged particle beam apparatus

Sample electrification measurement method and charged particle beam...

Charged particle beam apparatus

CHARGED PARTICLE BEAM APPARATUS AND CHARGED PARTICLE BEAM IRRADIATI...

Image evaluation method and microscope

Scanning electron microscope

Method and an apparatus of an inspection system using an electron beam

Electron microscope and electron bean inspection system.

Electron beam apparatus with aberration corrector

Method of forming a sample image and charged particle beam apparatus

Charged particle beam apparatus

Apparatus and method for wafer pattern inspection

Inspection system, inspection method, and process management method

Monochromator and scanning electron microscope using the same

Sample electrification measurement method and charged particle beam...

Method and an apparatus of an inspection system using an electron beam

Scanning electron microscope

Scanning electron microscope