Hidetami Yaegashi

Person

Tokyo-To, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment method and substrate treatment system
- Patent number 12,197,129
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming mask
- Patent number 11,467,497
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask forming method
- Patent number 11,205,571
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming film
- Patent number 10,741,444
- Issue date Aug 11, 2020
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 10,573,530
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 10,539,876
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 10,366,888
- Issue date Jul 30, 2019
- Tokyo Electron Limited
- Kazuki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method for forming a pattern
- Patent number 10,317,797
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Hidetami Yaegashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for photo-lithographic processing in semiconductor device ma...
- Patent number 10,211,050
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 10,074,557
- Issue date Sep 11, 2018
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,818,612
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, program, computer-readable storage med...
- Patent number 9,690,185
- Issue date Jun 27, 2017
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device...
- Patent number 9,679,770
- Issue date Jun 13, 2017
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and semiconductor device...
- Patent number 9,653,293
- Issue date May 16, 2017
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 9,459,535
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of topography to direct assembly of block copolymers in grapho-...
- Patent number 9,418,860
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 9,023,225
- Issue date May 5, 2015
- Tokyo Electron Limited
- Kenichi Oyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of forming mask pattern
- Patent number 8,551,691
- Issue date Oct 8, 2013
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate developing method, substrate processing method and develo...
- Patent number 8,415,092
- Issue date Apr 9, 2013
- Tokyo Electron Limited
- Momoko Shizukuishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, semiconductor device manufacturing method a...
- Patent number 8,283,253
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, semiconductor device manufacturing method a...
- Patent number 8,273,661
- Issue date Sep 25, 2012
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, program and system for processing substrate
- Patent number 8,263,320
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate developing method, substrate processing method and develo...
- Patent number 7,846,648
- Issue date Dec 7, 2010
- Tokyo Electron Limited
- Momoko Shizukuishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution supply nozzle with stirrer
- Patent number 7,367,710
- Issue date May 6, 2008
- Tokyo Electron Limited
- Momoko Shizukuishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for coating and developing
- Patent number 6,884,298
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 6,565,928
- Issue date May 20, 2003
- Tokyo Electron Limited
- Yasuhiro Sakamoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and system for coating and developing
- Patent number 6,518,199
- Issue date Feb 11, 2003
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and method
- Patent number 6,287,023
- Issue date Sep 11, 2001
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 6,284,044
- Issue date Sep 4, 2001
- Tokyo Electron Limited
- Yasuhiro Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing resist onto substrate and resist processing ap...
- Patent number 6,097,469
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING RESIST FILM
- Publication number 20210325780
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM
- Publication number 20210318618
- Publication date Oct 14, 2021
- Tokyo Electron Limited
- Satoru SHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FORMING METHOD
- Publication number 20200090927
- Publication date Mar 19, 2020
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING MASK
- Publication number 20200066536
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING FILM
- Publication number 20190355613
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20180374695
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Kazuki YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD FOR FORMING A PATTERN
- Publication number 20180143536
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170352584
- Publication date Dec 7, 2017
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170236720
- Publication date Aug 17, 2017
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170184972
- Publication date Jun 29, 2017
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20160358769
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20160225623
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufacturing Method
- Publication number 20160049292
- Publication date Feb 18, 2016
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MED...
- Publication number 20150241787
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...
- Publication number 20150235850
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...
- Publication number 20150227047
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...
- Publication number 20150111387
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANU...
- Publication number 20140235065
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20140094034
- Publication date Apr 3, 2014
- TOKYO ELECTRON LIMITED
- Kenichi OYAMA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20140083972
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Kenichi OYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130209941
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING MASK PATTERN AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20130023120
- Publication date Jan 24, 2013
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
- Publication number 20120312472
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
- Publication number 20120305183
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120220132
- Publication date Aug 30, 2012
- TOKYO ELECTRON LIMITED
- Kenichi OYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A PATTERN AND SEMICONDUCTOR DEVICE
- Publication number 20120211873
- Publication date Aug 23, 2012
- TOKYO ELECTRON LIMITED
- Kenichi OYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING MASK PATTERN
- Publication number 20120202301
- Publication date Aug 9, 2012
- TOKYO ELECTRON LIMITED
- Hidetami YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20120028471
- Publication date Feb 2, 2012
- TOKYO ELECTRON LIMITED
- Kenichi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20110220609
- Publication date Sep 15, 2011
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20110065280
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Shigeru Nakajima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hidetami Yaegashi

Person

Patents Grantslast 30 patents

Substrate treatment method and substrate treatment system

Method of forming mask

Mask forming method

Method of forming film

Pattern forming method

Pattern forming method

Pattern forming method

Pattern forming method for forming a pattern

Method for photo-lithographic processing in semiconductor device ma...

Pattern forming method

Method for manufacturing semiconductor device

Substrate processing method, program, computer-readable storage med...

Semiconductor device manufacturing method and semiconductor device...

Semiconductor device manufacturing method and semiconductor device...

Method of forming pattern

Use of topography to direct assembly of block copolymers in grapho-...

Pattern forming method

Method of forming mask pattern

Substrate developing method, substrate processing method and develo...

Pattern forming method, semiconductor device manufacturing method a...

Pattern forming method, semiconductor device manufacturing method a...

Method, program and system for processing substrate

Substrate developing method, substrate processing method and develo...

Developing solution supply nozzle with stirrer

Method and system for coating and developing

Film forming method and film forming apparatus

Method and system for coating and developing

Processing apparatus and method

Film forming method and film forming apparatus

Method of processing resist onto substrate and resist processing ap...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING RESIST FILM

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM

MASK FORMING METHOD

METHOD OF FORMING MASK

METHOD OF FORMING FILM

PATTERN FORMING METHOD

PATTERN FORMING METHOD FOR FORMING A PATTERN

PATTERN FORMING METHOD

PATTERN FORMING METHOD

PATTERN FORMING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Semiconductor Device Manufacturing Method

SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MED...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE...

USE OF TOPOGRAPHY TO DIRECT ASSEMBLY OF BLOCK COPOLYMERS IN GRAPHO-...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANU...

PATTERN FORMING METHOD

PATTERN FORMING METHOD

METHOD OF FORMING PATTERN

METHOD OF FORMING MASK PATTERN AND METHOD OF MANUFACTURING SEMICOND...

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD FOR FORMING A PATTERN AND SEMICONDUCTOR DEVICE

METHOD OF FORMING MASK PATTERN

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

MASK PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING...