Hidetoshi HANAOKA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,171
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,705,308
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Shintaro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,664,198
- Issue date May 30, 2023
- Tokyo Electron Limited
- Hirofumi Ohta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, processing method, and upper electrode...
- Patent number 11,488,807
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Kota Shihommatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,417,500
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,847,348
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,580,622
- Issue date Mar 3, 2020
- Tokyo Electron Limited
- Hidetoshi Hanaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,966,233
- Issue date May 8, 2018
- Tokyo Electron Limited
- Hidetoshi Hanaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,330,891
- Issue date May 3, 2016
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,251,998
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Hidetoshi Hanaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber cleaning method
- Patent number 8,999,068
- Issue date Apr 7, 2015
- Tokyo Electron Limited
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,603,293
- Issue date Dec 10, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,513,563
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,138,445
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,034,213
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,988,816
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,951,262
- Issue date May 31, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHOWER HEAD ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS
- Publication number 20230158517
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Ryosuke KUMAGAI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220336193
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND PLASMA PROCESSING APPARATUS
- Publication number 20210305023
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Masahiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210142983
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Shintaro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210118647
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PROCESSING METHOD, AND UPPER ELECTRODE...
- Publication number 20210074520
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200312634
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Hirofumi OHTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200176226
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180294147
- Publication date Oct 11, 2018
- TOKYO ELECTRON LIMITED
- Hidetoshi HANAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150114930
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Ryo NONAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150027635
- Publication date Jan 29, 2015
- TOKYO ELECTRON LIMITED
- Hidetoshi HANAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140124139
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120160418
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Hidetoshi HANAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120145679
- Publication date Jun 14, 2012
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110272097
- Publication date Nov 10, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PLANARIZATION METHOD
- Publication number 20110220492
- Publication date Sep 15, 2011
- TOKYO ELECTRON LIMITED
- Hidetoshi HANAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110214815
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD THEREOF AND STORAGE...
- Publication number 20110114113
- Publication date May 19, 2011
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- B08 - CLEANING
Information Patent Application
CHAMBER CLEANING METHOD
- Publication number 20110048453
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070235426
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070227664
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070227666
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060066247
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20060037703
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Hidetoshi HANAOKA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus, processing method, and upper electrode...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Chamber cleaning method

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method

Plasma processing apparatus and method

Patents Applicationslast 30 patents

SHOWER HEAD ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

EDGE RING AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS, PROCESSING METHOD, AND UPPER ELECTRODE...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

SURFACE PLANARIZATION METHOD

PLASMA PROCESSING APPARATUS AND METHOD

SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD THEREOF AND STORAGE...

CHAMBER CLEANING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and method

Plasma processing apparatus and method