Hidetoshi Ohnuma

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern correction method, exposure mask, manufacturing method of e...
- Patent number 8,221,942
- Issue date Jul 17, 2012
- Sony Corporation
- Mikio Oka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure pattern forming method and exposure pattern
- Patent number 7,200,834
- Issue date Apr 3, 2007
- Sony Corporation
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure pattern forming method and exposure pattern
- Patent number 7,165,235
- Issue date Jan 16, 2007
- Sony Corporation
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction apparatus and mask pattern correction metho...
- Patent number 7,139,996
- Issue date Nov 21, 2006
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure pattern forming method and exposure pattern
- Patent number 7,000,216
- Issue date Feb 14, 2006
- Sony Corporation
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule based OPC evaluating method and simulation-based OPC model eva...
- Patent number 6,928,636
- Issue date Aug 9, 2005
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask fabrication method, photomask, and exposure method thereof
- Patent number 6,924,068
- Issue date Aug 2, 2005
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correcting method of exposure pattern, exposure method, exposure sy...
- Patent number 6,492,078
- Issue date Dec 10, 2002
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern generating method and apparatus
- Patent number 6,391,501
- Issue date May 21, 2002
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus of correcting design-patterned data, method of...
- Patent number 6,370,441
- Issue date Apr 9, 2002
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure data correction method, exposing method, photomask, semico...
- Patent number 6,144,760
- Issue date Nov 7, 2000
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of exposing, with correction of pattern data used to draw ph...
- Patent number 5,885,748
- Issue date Mar 23, 1999
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting pattern data for drawing photomask to overcome...
- Patent number 5,792,581
- Issue date Aug 11, 1998
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN CORRECTION METHOD, EXPOSURE MASK, MANUFACTURING METHOD OF E...
- Publication number 20100183960
- Publication date Jul 22, 2010
- SONY CORPORATION
- Mikio Oka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, mask fabrication method, fabrication method of sem...
- Publication number 20060008712
- Publication date Jan 12, 2006
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure pattern forming method and exposure pattern
- Publication number 20050204330
- Publication date Sep 15, 2005
- Sony Corporation
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure pattern forming method and exposure pattern
- Publication number 20050174557
- Publication date Aug 11, 2005
- Sony Corporation
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask pattern correction apparatus, mask pattern correction method,...
- Publication number 20040073885
- Publication date Apr 15, 2004
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, mask fabrication method, fabrication method of sem...
- Publication number 20040029024
- Publication date Feb 12, 2004
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Opc mask manufacturing method, opc mask, and chip
- Publication number 20030177467
- Publication date Sep 18, 2003
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rule-based opc evaluating method and simulation base opc model eval...
- Publication number 20030149955
- Publication date Aug 7, 2003
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming exposure pattern and exposure pattern
- Publication number 20030140329
- Publication date Jul 24, 2003
- Kazuhisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask fabrication method, photomask, and exposure method thereof
- Publication number 20020045110
- Publication date Apr 18, 2002
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hidetoshi Ohnuma

Person

Patents Grantslast 30 patents

Pattern correction method, exposure mask, manufacturing method of e...

Exposure pattern forming method and exposure pattern

Exposure pattern forming method and exposure pattern

Mask pattern correction apparatus and mask pattern correction metho...

Exposure pattern forming method and exposure pattern

Rule based OPC evaluating method and simulation-based OPC model eva...

Photomask fabrication method, photomask, and exposure method thereof

Correcting method of exposure pattern, exposure method, exposure sy...

Pattern generating method and apparatus

Method and apparatus of correcting design-patterned data, method of...

Exposure data correction method, exposing method, photomask, semico...

Method of exposing, with correction of pattern data used to draw ph...

Method of correcting pattern data for drawing photomask to overcome...

Patents Applicationslast 30 patents

PATTERN CORRECTION METHOD, EXPOSURE MASK, MANUFACTURING METHOD OF E...

Exposure method, mask fabrication method, fabrication method of sem...

Exposure pattern forming method and exposure pattern

Exposure pattern forming method and exposure pattern

Mask pattern correction apparatus, mask pattern correction method,...

Exposure method, mask fabrication method, fabrication method of sem...

Opc mask manufacturing method, opc mask, and chip

Rule-based opc evaluating method and simulation base opc model eval...

Method for forming exposure pattern and exposure pattern

Photomask fabrication method, photomask, and exposure method thereof