Hidetoshi Satoh

Person

Hitachinaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask, the manufacturing method, a patterning method, and a sem...
- Patent number 6,927,002
- Issue date Aug 9, 2005
- Renesas Technology Corp.
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for charged particle beam exposure
- Patent number 6,759,666
- Issue date Jul 6, 2004
- Hitachi, Ltd.
- Koji Nagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron device manufacturing method, a pattern forming method, and...
- Patent number 6,750,000
- Issue date Jun 15, 2004
- Renesas Technology Corp.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, the manufacturing method, a patterning method, and a sem...
- Patent number 6,703,171
- Issue date Mar 9, 2004
- Hitachi, Ltd.
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron device manufacturing method, a pattern forming method, and...
- Patent number 6,653,052
- Issue date Nov 25, 2003
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,583,431
- Issue date Jun 24, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography system
- Patent number 6,573,520
- Issue date Jun 3, 2003
- Hitachi, Ltd.
- Hidetoshi Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,555,833
- Issue date Apr 29, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,509,572
- Issue date Jan 21, 2003
- Hitachi, Ltd.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,441,383
- Issue date Aug 27, 2002
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,329,665
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,320,198
- Issue date Nov 20, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,262,428
- Issue date Jul 17, 2001
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of fabricating semiconductor circuit devices utilizing multi...
- Patent number 6,159,644
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Hidetoshi Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography apparatus for forming pattern on...
- Patent number 6,121,625
- Issue date Sep 19, 2000
- Hitachi, Ltd.
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing system
- Patent number 5,650,631
- Issue date Jul 22, 1997
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Aperture plate and a method of manufacturing the same
- Patent number 5,520,297
- Issue date May 28, 1996
- Hitachi, Ltd.
- Teruyuki Kagami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography apparatus having electron optics correcti...
- Patent number 5,396,077
- Issue date Mar 7, 1995
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Electron device manufacturing method, a pattern forming method, and...
- Publication number 20040043307
- Publication date Mar 4, 2004
- Hitachi, Limited
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020179856
- Publication date Dec 5, 2002
- Hitachi, Ltd
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020100881
- Publication date Aug 1, 2002
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam lithography apparatus for forming pattern on...
- Publication number 20020096651
- Publication date Jul 25, 2002
- Hiroyuki Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask, the manufacturing method, a patterning method, and a sem...
- Publication number 20020094483
- Publication date Jul 18, 2002
- Hitachi, Ltd.
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, the manufacturing method, a patterning method, and a sem...
- Publication number 20020086223
- Publication date Jul 4, 2002
- Takashi Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for charged particle beam exposure
- Publication number 20020027198
- Publication date Mar 7, 2002
- Koji Nagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron device manufacturing method, a pattern forming method, and...
- Publication number 20010033995
- Publication date Oct 25, 2001
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hidetoshi Satoh

Person

Patents Grantslast 30 patents

Photomask, the manufacturing method, a patterning method, and a sem...

Method and apparatus for charged particle beam exposure

Electron device manufacturing method, a pattern forming method, and...

Photomask, the manufacturing method, a patterning method, and a sem...

Electron device manufacturing method, a pattern forming method, and...

Charged particle beam lithography apparatus for forming pattern on...

Electron beam lithography system

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Method of fabricating semiconductor circuit devices utilizing multi...

Charged particle beam lithography apparatus for forming pattern on...

Electron beam writing system

Aperture plate and a method of manufacturing the same

Electron beam lithography apparatus having electron optics correcti...

Patents Applicationslast 30 patents

Electron device manufacturing method, a pattern forming method, and...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Charged particle beam lithography apparatus for forming pattern on...

Photomask, the manufacturing method, a patterning method, and a sem...

Photomask, the manufacturing method, a patterning method, and a sem...

Method and apparatus for charged particle beam exposure

Electron device manufacturing method, a pattern forming method, and...