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Hideyoshi TAKAMIZAWA
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Tokyo-to, JP
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Patents Grants
last 30 patents
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Patent Grant
Mask blank, phase shift mask, and production method thereof
Patent number
9,971,238
Issue date
May 15, 2018
Dai Nippon Printing Co., Ltd.
Hiroshi Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blank, mask blank with negative resist film, phase shift mask,...
Patent number
9,874,808
Issue date
Jan 23, 2018
Dai Nippon Printing Co., Ltd.
Takashi Adachi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask and methods for manufacturing and correcting photomask
Patent number
8,974,987
Issue date
Mar 10, 2015
Dai Nippon Printing Co., Ltd.
Takaharu Nagai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
MASK BLANK, PHASE SHIFT MASK, AND PRODUCTION METHOD THEREOF
Publication number
20170123305
Publication date
May 4, 2017
DAI NIPPON PRINTING CO., LTD.
Hiroshi WATANABE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK, MASK BLANK WITH NEGATIVE RESIST FILM, PHASE SHIFT MASK,...
Publication number
20160195803
Publication date
Jul 7, 2016
DAI NIPPON PRINTING CO., LTD.
Takashi ADACHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
Publication number
20110294045
Publication date
Dec 1, 2011
DAI NIPPON PRINTING CO., LTD.
Takaharu Nagai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY