Hikaru TOKUNAGA

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition including cyclic carbony...
- Patent number 12,072,630
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,044,969
- Issue date Jul 23, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing amide solvent
- Patent number 11,798,810
- Issue date Oct 24, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 11,720,024
- Issue date Aug 8, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 11,681,223
- Issue date Jun 20, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stepped substrate coating composition containing compound having cu...
- Patent number 11,674,051
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition using a fluorene compound
- Patent number 11,506,980
- Issue date Nov 22, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crosslinkable compound-containing photocurable stepped substrate-co...
- Patent number 11,454,889
- Issue date Sep 27, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Multi-level substrate coating film-forming composition containing p...
- Patent number 11,385,546
- Issue date Jul 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film-forming composition
- Patent number 11,112,696
- Issue date Sep 7, 2021
- NISSAN CHEMICAL CORPORATION
- Yuto Hashimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming film protecting against aqueous hydrogen pe...
- Patent number 10,894,887
- Issue date Jan 19, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stepped substrate-coating composition containing polyether resin ha...
- Patent number 10,871,712
- Issue date Dec 22, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20240006183
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240004296
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230359123
- Publication date Nov 9, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20230324802
- Publication date Oct 12, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230259031
- Publication date Aug 17, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20230244141
- Publication date Aug 3, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DER...
- Publication number 20230203299
- Publication date Jun 29, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230161246
- Publication date May 25, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20230112897
- Publication date Apr 13, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING
- Publication number 20230060585
- Publication date Mar 2, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20220404707
- Publication date Dec 22, 2022
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220342306
- Publication date Oct 27, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...
- Publication number 20220269176
- Publication date Aug 25, 2022
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220155686
- Publication date May 19, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220146939
- Publication date May 12, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING CYCLIC CARBONY...
- Publication number 20210124268
- Publication date Apr 29, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUB...
- Publication number 20210116814
- Publication date Apr 22, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20210054231
- Publication date Feb 25, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...
- Publication number 20210024773
- Publication date Jan 28, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND
- Publication number 20200379350
- Publication date Dec 3, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...
- Publication number 20200301278
- Publication date Sep 24, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSSLINKABLE COMPOUND-CONTAINING PHOTOCURABLE STEPPED SUBSTRATE-CO...
- Publication number 20200225585
- Publication date Jul 16, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROTECTIVE FILM-FORMING COMPOSITION
- Publication number 20200183282
- Publication date Jun 11, 2020
- NISSAN CHEMICAL CORPORATION
- Yuto HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...
- Publication number 20200131376
- Publication date Apr 30, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20200124966
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20190354018
- Publication date Nov 21, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20190171101
- Publication date Jun 6, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH IMPROVED FILM D...
- Publication number 20190137878
- Publication date May 9, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...
- Publication number 20190079397
- Publication date Mar 14, 2019
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS

Hikaru TOKUNAGA

Person

Patents Grantslast 30 patents

Photocurable composition and method for producing semiconductor device

Resist underlayer film-forming composition including cyclic carbony...

Resist underlayer film-forming composition

Resist underlayer film-forming composition containing amide solvent

Resist underlayer film-forming composition containing indolocarbazo...

Photocurable composition and method for producing semiconductor device

Stepped substrate coating composition containing compound having cu...

Resist underlayer film forming composition using a fluorene compound

Crosslinkable compound-containing photocurable stepped substrate-co...

Multi-level substrate coating film-forming composition containing p...

Protective film-forming composition

Composition for forming film protecting against aqueous hydrogen pe...

Stepped substrate-coating composition containing polyether resin ha...

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DER...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING CYCLIC CARBONY...

RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUB...

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...

RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND

STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...

CROSSLINKABLE COMPOUND-CONTAINING PHOTOCURABLE STEPPED SUBSTRATE-CO...

PROTECTIVE FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...

MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH IMPROVED FILM D...

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...