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Hikaru WATANABE

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    ETCHING APPARATUS
    • Publication number 20220181162
    • Publication date Jun 9, 2022
    • TOKYO ELECTRON LIMITED
    • Akihiro TSUJI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20220051904
    • Publication date Feb 17, 2022
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20200211854
    • Publication date Jul 2, 2020
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RE...
    • Publication number 20200161138
    • Publication date May 21, 2020
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20190027372
    • Publication date Jan 24, 2019
    • TOKYO ELECTRON LIMITED
    • Akihiro TSUJI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RE...
    • Publication number 20180366338
    • Publication date Dec 20, 2018
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF SELECTIVELY ETCHING SILICON OXIDE FILM ON SUBSTRATE
    • Publication number 20180190505
    • Publication date Jul 5, 2018
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20170140923
    • Publication date May 18, 2017
    • TOKYO ELECTRON LIMITED
    • Hikaru WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20170092509
    • Publication date Mar 30, 2017
    • Hikaru WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160247691
    • Publication date Aug 25, 2016
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160211148
    • Publication date Jul 21, 2016
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160211149
    • Publication date Jul 21, 2016
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20160211150
    • Publication date Jul 21, 2016
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    WORKPIECE PROCESSING METHOD
    • Publication number 20160005651
    • Publication date Jan 7, 2016
    • TOKYO ELECTRON LIMITED
    • Hikaru WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20150325415
    • Publication date Nov 12, 2015
    • TOKYO ELECTRON LIMITED
    • Hikaru WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20150235860
    • Publication date Aug 20, 2015
    • TOKYO ELECTRON LIMITED
    • Maju Tomura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20150170932
    • Publication date Jun 18, 2015
    • TOKYO ELECTRON LIMITED
    • Maju TOMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF ETCHING SILICON OXIDE FILM
    • Publication number 20150056808
    • Publication date Feb 26, 2015
    • TOKYO ELECTRON LIMITED
    • Masahiro OGASAWARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20140256147
    • Publication date Sep 11, 2014
    • TOKYO ELECTRON LIMITED
    • Hikaru Watanabe
    • H01 - BASIC ELECTRIC ELEMENTS