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Himendra JHA
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Berlin, DE
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last 30 patents
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Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
12,071,702
Issue date
Aug 27, 2024
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Acidic aqueous composition for electrolytically depositing a copper...
Patent number
12,054,843
Issue date
Aug 6, 2024
Atotech Deutschland GmbH & Co. KG
Ralf Schmidt
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
11,035,051
Issue date
Jun 15, 2021
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
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Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTICALLY DEPOSITING A COPPER...
Publication number
20230142446
Publication date
May 11, 2023
Atotech Deutschland GmbH & Co. KG
Ralf SCHMIDT
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20210262105
Publication date
Aug 26, 2021
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20190203369
Publication date
Jul 4, 2019
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR