Hin-Yiu Anthony Chung

Person

Ulm, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography apparatus and method for producing a mirror arrangement
- Patent number 9,459,538
- Issue date Oct 4, 2016
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT
- Publication number 20150055112
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
COMPONENT OF AN EUV OR UV LITHOGRAPHY APPARATUS AND METHOD FOR PROD...
- Publication number 20120120378
- Publication date May 17, 2012
- Carl Zeiss SMT GMBH
- Hin Yiu Anthony CHUNG
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
- Publication number 20120086925
- Publication date Apr 12, 2012
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR BONDING BODIES AND COMPOSITE BODY
- Publication number 20120082823
- Publication date Apr 5, 2012
- Carl Zeiss SMT GMBH
- Hin Yiu Anthony CHUNG
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
EUV Lithography Device and Method For Processing An Optical Element
- Publication number 20110279799
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
- Publication number 20110058147
- Publication date Mar 10, 2011
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...
- Publication number 20110043774
- Publication date Feb 24, 2011
- Carl Zeiss SMT AG
- Stefan HEMBACHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
- Publication number 20100071720
- Publication date Mar 25, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20100007866
- Publication date Jan 14, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Hin-Yiu Anthony Chung

Person

Patents Grantslast 30 patents

Lithography apparatus and method for producing a mirror arrangement

Patents Applicationslast 30 patents

LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT

COMPONENT OF AN EUV OR UV LITHOGRAPHY APPARATUS AND METHOD FOR PROD...

METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM

METHOD FOR BONDING BODIES AND COMPOSITE BODY

EUV Lithography Device and Method For Processing An Optical Element

CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...

METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS