Hiroaki Ashizawa

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, method for manufacturing semiconductor device,...
- Patent number 12,119,219
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor film forming method using hydrazine-based compound gas
- Patent number 11,348,794
- Issue date May 31, 2022
- Tokyo Electron Limited
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 10,864,548
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate mounting method and substrate mounting device
- Patent number 10,340,176
- Issue date Jul 2, 2019
- Tokyo Electron Limited
- Toshiaki Fujisato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 9,963,784
- Issue date May 8, 2018
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium film formation method and storage medium
- Patent number 9,331,139
- Issue date May 3, 2016
- Tokyo Electron Limited
- Hiroaki Ashizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method, cleaning method and film formation apparatus
- Patent number 8,021,717
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-substrate-heat-processing apparatus and method for semicondu...
- Patent number 6,407,010
- Issue date Jun 18, 2002
- Tokyo Electron Limited
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20220157600
- Publication date May 19, 2022
- Tokyo Electron Limited
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20200063258
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Tsuyoshi TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20190378723
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Hideo Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20180311700
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Hiroaki Ashizawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE MOUNTING METHOD AND SUBSTRATE MOUNTING DEVICE
- Publication number 20180040503
- Publication date Feb 8, 2018
- TOKYO ELECTRON LIMITED
- Toshiaki FUJISATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20150110959
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM FILM FORMATION METHOD AND STORAGE MEDIUM
- Publication number 20140287585
- Publication date Sep 25, 2014
- TOKYO ELECTRON LIMITED
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING RUTHENIUM OXIDE FILM
- Publication number 20130115367
- Publication date May 9, 2013
- TOKYO ELECTRON LIMITED
- Naotaka NORO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD, CLEANING METHOD AND FILM FORMATION APPARATUS
- Publication number 20090142513
- Publication date Jun 4, 2009
- TOKYO ELECTRON LIMITED
- Seishi MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-formation method for semiconductor process
- Publication number 20050136657
- Publication date Jun 23, 2005
- TOKYO ELECTRON LIMITED
- Hiroaki Yokoi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Single-substrate-heat-processing apparatus and method for semicondu...
- Publication number 20020022379
- Publication date Feb 21, 2002
- Hiroaki Ashizawa
- H01 - BASIC ELECTRIC ELEMENTS

Hiroaki Ashizawa

Person

Patents Grantslast 30 patents

Film forming method, method for manufacturing semiconductor device,...

Semiconductor film forming method using hydrazine-based compound gas

Film forming method and film forming apparatus

Substrate mounting method and substrate mounting device

Film forming method and film forming apparatus

Ruthenium film formation method and storage medium

Film formation method, cleaning method and film formation apparatus

Single-substrate-heat-processing apparatus and method for semicondu...

Patents Applicationslast 30 patents

FILM FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE,...

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE MOUNTING METHOD AND SUBSTRATE MOUNTING DEVICE

FILM FORMING METHOD AND FILM FORMING APPARATUS

RUTHENIUM FILM FORMATION METHOD AND STORAGE MEDIUM

METHOD FOR FORMING RUTHENIUM OXIDE FILM

FILM FORMATION METHOD, CLEANING METHOD AND FILM FORMATION APPARATUS

Film-formation method for semiconductor process

Single-substrate-heat-processing apparatus and method for semicondu...