Hiroaki ISHIMURA

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,099,349
- Issue date Aug 4, 2015
- Hitachi High-Technologies Corporation
- Naoyuki Kofuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,018,075
- Issue date Apr 28, 2015
- Hitachi High-Technologies Corporation
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 8,486,291
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Takeshi Ohmori
- B08 - CLEANING
Information Patent Grant
Dry etching method
- Patent number 8,207,066
- Issue date Jun 26, 2012
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,224,568
- Issue date May 29, 2007
- Hitachi High-Technologies Corporation
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 7,098,138
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 6,709,984
- Issue date Mar 23, 2004
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 6,617,255
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140175534
- Publication date Jun 26, 2014
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140151327
- Publication date Jun 5, 2014
- Hitachi High-Technologies Corporation
- Satoshi UNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130164911
- Publication date Jun 27, 2013
- Hitachi High-Technologies Corporation
- Toru ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20120125890
- Publication date May 24, 2012
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- B08 - CLEANING
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100255612
- Publication date Oct 7, 2010
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20060171093
- Publication date Aug 3, 2006
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20060048892
- Publication date Mar 9, 2006
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20040175940
- Publication date Sep 9, 2004
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20040048477
- Publication date Mar 11, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20040033695
- Publication date Feb 19, 2004
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20010055885
- Publication date Dec 27, 2001
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Hiroaki ISHIMURA

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing method

Plasma processing method

Plasma processing method

Dry etching method

Plasma processing method and plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

Method for manufacturing semiconductor device

Plasma processing method for working the surface of semiconductor d...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PLASMA ETCHING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

DRY ETCHING METHOD

Plasma processing method and plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...

Method for manufacturing semiconductor device

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Plasma processing method for working the surface of semiconductor d...