Hiroaki Shimizu

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,494,866
- Issue date Nov 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,411,224
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,405,200
- Issue date Aug 2, 2016
- TOYKO OHKA KOGYO CO., LTD.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,377,685
- Issue date Jun 28, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,585
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,005,872
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming resist pattern
- Patent number 8,968,990
- Issue date Mar 3, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,956,800
- Issue date Feb 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and novel comp...
- Patent number 8,900,795
- Issue date Dec 2, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 8,790,868
- Issue date Jul 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for negative development and method of forming r...
- Patent number 8,765,354
- Issue date Jul 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,614,049
- Issue date Dec 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and polymeric compound
- Patent number 8,519,073
- Issue date Aug 27, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,518,629
- Issue date Aug 27, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,475,997
- Issue date Jul 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,367,299
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,349,534
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,323,869
- Issue date Dec 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and method of producing same, acid generator, resist compo...
- Patent number 8,252,505
- Issue date Aug 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,252,509
- Issue date Aug 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, and novel com...
- Patent number 8,247,160
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,221,956
- Issue date Jul 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,211,616
- Issue date Jul 3, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,206,890
- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,142,979
- Issue date Mar 27, 2012
- Tokyo Ohka Tokyo Co., Ltd.
- Tsuyoshi Kurosawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,124,313
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,105,747
- Issue date Jan 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING DEVICE, LEARN...
- Publication number 20220301662
- Publication date Sep 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20150147702
- Publication date May 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344436
- Publication date Dec 26, 2013
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130189618
- Publication date Jul 25, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMP...
- Publication number 20130177854
- Publication date Jul 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130177853
- Publication date Jul 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130137047
- Publication date May 30, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hideto Nito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130084523
- Publication date Apr 4, 2013
- TOKYO OHKA KOGYO CO., LTD.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130078572
- Publication date Mar 28, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130017500
- Publication date Jan 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...
- Publication number 20120276481
- Publication date Nov 1, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING R...
- Publication number 20120264058
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120214101
- Publication date Aug 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20120164580
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120148956
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120094236
- Publication date Apr 19, 2012
- Daiju SHIONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20120009521
- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20110311917
- Publication date Dec 22, 2011
- Tsuyoshi KUROSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110117491
- Publication date May 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...
- Publication number 20100248148
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100233626
- Publication date Sep 16, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100233623
- Publication date Sep 16, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20100121077
- Publication date May 13, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100075249
- Publication date Mar 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND POLYMERIC COMPOUND
- Publication number 20100069590
- Publication date Mar 18, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20100015552
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100015553
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COM...
- Publication number 20100015555
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist composition for immersion exposure, method of forming resist...
- Publication number 20090317743
- Publication date Dec 24, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hiroaki Shimizu

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and novel comp...

Method of forming resist pattern and negative tone-development resi...

Resist composition for negative development and method of forming r...

Resist composition and method of forming resist pattern

Compound and polymeric compound

Resist composition for immersion exposure and method of forming res...

Resist composition for immersion exposure, method of forming resist...

Resist composition, method of forming resist pattern, compound and...

Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Compound and method of producing same, acid generator, resist compo...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, and novel com...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound and...

Resist composition for immersion exposure and method of forming res...

Resist composition, method of forming resist pattern, novel compoun...

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING DEVICE, LEARN...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMP...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...

RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING R...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND AND POLYMERIC COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COM...

Resist composition for immersion exposure, method of forming resist...