Hiroaki Takaiwa

Person

Kumagaya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 10,151,983
- Issue date Dec 11, 2018
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, method for producing device, a...
- Patent number 10,088,760
- Issue date Oct 2, 2018
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Patent number 10,012,909
- Issue date Jul 3, 2018
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,846,371
- Issue date Dec 19, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holding device, exposure apparatus, and device manufactur...
- Patent number 9,341,959
- Issue date May 17, 2016
- Nikon Corporation
- Makoto Shibuta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,268,237
- Issue date Feb 23, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,235,139
- Issue date Jan 12, 2016
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus with component from which liquid is protected an...
- Patent number 9,223,224
- Issue date Dec 29, 2015
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, method for producing device, a...
- Patent number 9,182,685
- Issue date Nov 10, 2015
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Patent number 9,041,901
- Issue date May 26, 2015
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure apparatus and method that detects liquid adhered...
- Patent number 9,041,906
- Issue date May 26, 2015
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, method for producing device, a...
- Patent number 9,019,469
- Issue date Apr 28, 2015
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 9,019,467
- Issue date Apr 28, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Patent number 8,867,017
- Issue date Oct 21, 2014
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Patent number 8,854,599
- Issue date Oct 7, 2014
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure apparatus and method that detects residual liqui...
- Patent number 8,767,168
- Issue date Jul 1, 2014
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus and exposure apparatus
- Patent number 8,749,755
- Issue date Jun 10, 2014
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, method for producing device, and method for con...
- Patent number 8,749,757
- Issue date Jun 10, 2014
- Nikon Corporation
- Nobutaka Magome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer table having sensor for immersion lithography
- Patent number 8,508,718
- Issue date Aug 13, 2013
- Nikon Corporation
- Andrew J Hazelton
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Immersion exposure apparatus and method that detects residual liqui...
- Patent number 8,488,101
- Issue date Jul 16, 2013
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, method for producing device, and method for con...
- Patent number 8,451,424
- Issue date May 28, 2013
- Nikon Corporation
- Nobutaka Magome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,384,880
- Issue date Feb 26, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, substrate stage, exposure apparatus, and device ma...
- Patent number 8,208,117
- Issue date Jun 26, 2012
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holding device, exposure apparatus, and device manufactur...
- Patent number 8,102,512
- Issue date Jan 24, 2012
- Nikon Corporation
- Makoto Shibuta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure apparatus, exposure method, method for producing device, a...
- Patent number 8,054,447
- Issue date Nov 8, 2011
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method for producing device
- Patent number 8,034,539
- Issue date Oct 11, 2011
- Nikon Corporation
- Nobutaka Magome
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Immersion exposure apparatus and device manufacturing method with l...
- Patent number 7,990,516
- Issue date Aug 2, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure apparatus and device manufacturing method with r...
- Patent number 7,990,517
- Issue date Aug 2, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus and exposure apparatus
- Patent number 7,973,910
- Issue date Jul 5, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Patent number 7,847,916
- Issue date Dec 7, 2010
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190094708
- Publication date Mar 28, 2019
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...
- Publication number 20180364581
- Publication date Dec 20, 2018
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...
- Publication number 20180299789
- Publication date Oct 18, 2018
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...
- Publication number 20180292759
- Publication date Oct 11, 2018
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20170329234
- Publication date Nov 16, 2017
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...
- Publication number 20160231653
- Publication date Aug 11, 2016
- Nikon Corporation
- Hiroyuki NAGASAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Apparatus with Component from which Liquid is Protected an...
- Publication number 20160103397
- Publication date Apr 14, 2016
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20150301457
- Publication date Oct 22, 2015
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...
- Publication number 20150286151
- Publication date Oct 8, 2015
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20150234293
- Publication date Aug 20, 2015
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...
- Publication number 20150234282
- Publication date Aug 20, 2015
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...
- Publication number 20140022523
- Publication date Jan 23, 2014
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY
- Publication number 20130301016
- Publication date Nov 14, 2013
- Nikon Corporation
- Andrew J. Hazelton
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY
- Publication number 20130301018
- Publication date Nov 14, 2013
- Andrew J. HAZELTON
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130293855
- Publication date Nov 7, 2013
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141703
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...
- Publication number 20130141701
- Publication date Jun 6, 2013
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...
- Publication number 20130135596
- Publication date May 30, 2013
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CON...
- Publication number 20130135597
- Publication date May 30, 2013
- Nikon Corporation
- Nobutaka MAGOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...
- Publication number 20120094238
- Publication date Apr 19, 2012
- Nikon Corporation
- Hiroyuki NAGASAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and device manufacturing method
- Publication number 20110261345
- Publication date Oct 27, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and device manufacturing method
- Publication number 20110261331
- Publication date Oct 27, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus and exposure apparatus
- Publication number 20110228240
- Publication date Sep 22, 2011
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Publication number 20110013161
- Publication date Jan 20, 2011
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus preventing gas from moving from exposure region...
- Publication number 20100259737
- Publication date Oct 14, 2010
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid recovery apparatus, exposure apparatus, exposure method, and...
- Publication number 20090128793
- Publication date May 21, 2009
- Nikon Corporation
- Hideaki Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer table for immersion lithography
- Publication number 20090109418
- Publication date Apr 30, 2009
- Nikon Corporation
- Andrew J. Hazelton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015816
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, substrate stage, exposure apparatus, and device ma...
- Publication number 20090015808
- Publication date Jan 15, 2009
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Apparatus and Device Manufacturing Method
- Publication number 20080151200
- Publication date Jun 26, 2008
- Nikon Corporation
- Hiroaki Takaiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroaki Takaiwa

Person

Patents Grantslast 30 patents

Exposure apparatus and device manufacturing method

Exposure apparatus, exposure method, method for producing device, a...

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Exposure method, substrate stage, exposure apparatus, and device ma...

Substrate holding device, exposure apparatus, and device manufactur...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure apparatus with component from which liquid is protected an...

Exposure apparatus, exposure method, method for producing device, a...

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Immersion exposure apparatus and method that detects liquid adhered...

Exposure apparatus, exposure method, method for producing device, a...

Exposure method, substrate stage, exposure apparatus, and device ma...

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Immersion exposure apparatus and method that detects residual liqui...

Stage apparatus and exposure apparatus

Exposure apparatus, method for producing device, and method for con...

Wafer table having sensor for immersion lithography

Immersion exposure apparatus and method that detects residual liqui...

Exposure apparatus, method for producing device, and method for con...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Substrate holding device, exposure apparatus, and device manufactur...

Exposure apparatus, exposure method, method for producing device, a...

Exposure apparatus and method for producing device

Immersion exposure apparatus and device manufacturing method with l...

Immersion exposure apparatus and device manufacturing method with r...

Stage apparatus and exposure apparatus

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Patents Applicationslast 30 patents

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...

LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...

SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...

Exposure Apparatus with Component from which Liquid is Protected an...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...

EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, A...

WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY

WAFER TABLE HAVING SENSOR FOR IMMERSION LITHOGRAPHY

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MA...

LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND...

EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CON...

SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTUR...

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Stage apparatus and exposure apparatus

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Exposure apparatus preventing gas from moving from exposure region...

Liquid recovery apparatus, exposure apparatus, exposure method, and...

Wafer table for immersion lithography

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure method, substrate stage, exposure apparatus, and device ma...

Exposure Apparatus and Device Manufacturing Method