Hiroaki Tomimori

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device to form a via hole
- Patent number 7,786,005
- Issue date Aug 31, 2010
- NEC Electronics Corporation
- Kenichi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a high-k film on a semiconductor device
- Patent number 7,718,532
- Issue date May 18, 2010
- NEC Electronics Corporation
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing solution, cleaning method for semiconductor substrate, and...
- Patent number 7,592,266
- Issue date Sep 22, 2009
- NEC Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Process for making a semiconductor device having a roughened surface
- Patent number 7,560,372
- Issue date Jul 14, 2009
- NEC Electronics Corporation
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution for semiconductor substrate
- Patent number 7,312,186
- Issue date Dec 25, 2007
- Kanto Chemical Co., Inc.
- Masayuki Takashima
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Removing solution, cleaning method for semiconductor substrate, and...
- Patent number 7,312,160
- Issue date Dec 25, 2007
- NEC Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,268,087
- Issue date Sep 11, 2007
- NEC Electronics Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a high-k film on a semiconductor device
- Patent number 7,192,835
- Issue date Mar 20, 2007
- NEC Electronics Corporation
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anticorrosive treating concentrate
- Patent number 7,186,354
- Issue date Mar 6, 2007
- NEC Electronics Corporation
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having a roughened surface
- Patent number 7,170,172
- Issue date Jan 30, 2007
- NEC Electronics Corporation
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Washing liquid composition for semiconductor substrate
- Patent number 7,138,362
- Issue date Nov 21, 2006
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post-CMP washing liquid composition
- Patent number 7,087,562
- Issue date Aug 8, 2006
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning method, method for fabricating semiconductor device and cl...
- Patent number 6,998,352
- Issue date Feb 14, 2006
- NEC Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Stripping agent composition and method of stripping
- Patent number 6,992,050
- Issue date Jan 31, 2006
- NEC Corporation
- Tatsuya Koita
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor wafer surface and method of treating a semiconductor...
- Patent number 6,897,150
- Issue date May 24, 2005
- NEC Electronics Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device fabricating method and treating liquid
- Patent number 6,890,864
- Issue date May 10, 2005
- NEC Electronics Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of washing a semiconductor wafer
- Patent number 6,864,187
- Issue date Mar 8, 2005
- NEC Electronics Corporation
- Hiroaki Tomimori
- B08 - CLEANING
Information Patent Grant
Cleaning water for cleaning a wafer and method of cleaning a wafer
- Patent number 6,797,648
- Issue date Sep 28, 2004
- NEC Electronics Corporation
- Hidemitsu Aoki
- B08 - CLEANING
Information Patent Grant
Manufacturing method of semicondcutor device
- Patent number 6,787,480
- Issue date Sep 7, 2004
- NEC Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device by simultaneously cleaning...
- Patent number 6,592,677
- Issue date Jul 15, 2003
- NEC Electronics Corporation
- Hiroaki Tomimori
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
Method of forming a high-k film on a semiconductor device
- Publication number 20080081445
- Publication date Apr 3, 2008
- NEC ELECTRONICS CORPORATION
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVING SOLUTION, CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE, AND...
- Publication number 20080066779
- Publication date Mar 20, 2008
- NEC ELECTRONICS CORPORATION
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process or making a semiconductor device having a roughened surface
- Publication number 20070015351
- Publication date Jan 18, 2007
- NEC ELECTRONICS CORPORATION
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20060214300
- Publication date Sep 28, 2006
- NEC ELECTRONICS CORPORATION
- Kenichi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20040266171
- Publication date Dec 30, 2004
- NEC Electronics Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20040248350
- Publication date Dec 9, 2004
- NEC ELECTRONIC CORPORATION
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning solution for semiconductor substrate
- Publication number 20040161933
- Publication date Aug 19, 2004
- Sumitomo Chemical Company, Limited
- Masayuki Takashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid composition for cleaning hydrophobic substrate and cleaning...
- Publication number 20040116315
- Publication date Jun 17, 2004
- NEC ELECTRONICS CORPORATION
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Stripping agent composition and method of stripping
- Publication number 20040029051
- Publication date Feb 12, 2004
- Tatsuya Koita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post-CMP washing liquid composition
- Publication number 20030216270
- Publication date Nov 20, 2003
- Yumiko Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Washing liquid composition for semiconductor substrate
- Publication number 20030171233
- Publication date Sep 11, 2003
- Yumiko Abe
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Removing solution, cleaning method for semiconductor substrate, and...
- Publication number 20030139045
- Publication date Jul 24, 2003
- NEC ELECTRONICS CORPORATION
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device fabricating method and treating liquid
- Publication number 20030134507
- Publication date Jul 17, 2003
- NEC Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for producing the same
- Publication number 20030111731
- Publication date Jun 19, 2003
- NEC ELECTRONICS CORPORATION
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wash water or immersion water used during semiconductor manufacturing
- Publication number 20030094610
- Publication date May 22, 2003
- Hidemitsu Aoki
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Cleaning method, method for fabricating semiconductor device and cl...
- Publication number 20030087524
- Publication date May 8, 2003
- NEC Corporation
- Hidemitsu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device fabricating method and treating liquid
- Publication number 20030027418
- Publication date Feb 6, 2003
- NEC Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method of washing a semiconductor wafer
- Publication number 20030013310
- Publication date Jan 16, 2003
- NEC Corporation
- Hiroaki Tomimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning water for cleaning a wafer and method of cleaning a wafer
- Publication number 20020189639
- Publication date Dec 19, 2002
- NEC Corporation
- Hidemitsu Aoki
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20020155702
- Publication date Oct 24, 2002
- NEC Corporation
- Hidemitsu Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anticorrosive treating concentrate
- Publication number 20010030315
- Publication date Oct 18, 2001
- NEC Corporation and Sumitomo Chemical Company Limited
- Hidemitsu Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroaki Tomimori

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor device to form a via hole

Method of forming a high-k film on a semiconductor device

Removing solution, cleaning method for semiconductor substrate, and...

Process for making a semiconductor device having a roughened surface

Cleaning solution for semiconductor substrate

Removing solution, cleaning method for semiconductor substrate, and...

Manufacturing method of semiconductor device

Method of forming a high-k film on a semiconductor device

Anticorrosive treating concentrate

Semiconductor device having a roughened surface

Washing liquid composition for semiconductor substrate

Post-CMP washing liquid composition

Cleaning method, method for fabricating semiconductor device and cl...

Stripping agent composition and method of stripping

Semiconductor wafer surface and method of treating a semiconductor...

Semiconductor device fabricating method and treating liquid

Method of washing a semiconductor wafer

Cleaning water for cleaning a wafer and method of cleaning a wafer

Manufacturing method of semicondcutor device

Method of forming a semiconductor device by simultaneously cleaning...

Patents Applicationslast 30 patents

Method of forming a high-k film on a semiconductor device

REMOVING SOLUTION, CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE, AND...

Process or making a semiconductor device having a roughened surface

Method for manufacturing semiconductor device

Manufacturing method of semiconductor device

Method for manufacturing semiconductor device

Cleaning solution for semiconductor substrate

Liquid composition for cleaning hydrophobic substrate and cleaning...

Stripping agent composition and method of stripping

Post-CMP washing liquid composition

Washing liquid composition for semiconductor substrate

Removing solution, cleaning method for semiconductor substrate, and...

Semiconductor device fabricating method and treating liquid

Semiconductor device and method for producing the same

Wash water or immersion water used during semiconductor manufacturing

Cleaning method, method for fabricating semiconductor device and cl...

Semiconductor device fabricating method and treating liquid

Method of washing a semiconductor wafer

Cleaning water for cleaning a wafer and method of cleaning a wafer

Manufacturing method of semiconductor device

Anticorrosive treating concentrate