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Hiroaki Wakabayashi
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Kodaira, JP
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last 30 patents
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Patent Grant
Electron beam lithography system and method
Patent number
5,424,173
Issue date
Jun 13, 1995
Hitachi, Ltd.
Hiroaki Wakabayashi
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Charged beam exposure method and apparatus as well as aperture stop...
Patent number
5,334,845
Issue date
Aug 2, 1994
Hitachi Limited
Hiroaki Wakabayashi
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Electron beam lithography system and method
Patent number
5,097,138
Issue date
Mar 17, 1992
Hitachi, Ltd.
Hiroaki Wakabayashi
B82 - NANO-TECHNOLOGY