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Hirofumi Ishida
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Atsugi-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Cup-shaped plating apparatus
Patent number
7,179,359
Issue date
Feb 20, 2007
Electroplating Engineers of Japan, Ltd
Hirofumi Ishida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Wafer plating apparatus
Patent number
6,736,945
Issue date
May 18, 2004
Electroplating Engineers of Japan Limited
Hirofumi Ishida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cup-type plating method and cleaning apparatus used therefor
Patent number
6,224,670
Issue date
May 1, 2001
Electroplating Engineers of Japan Limited
Hirofumi Ishida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Flexible continuous cathode contact circuit for electrolytic platin...
Patent number
5,871,626
Issue date
Feb 16, 1999
Intel Corporation
Douglas E. Crafts
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Flexible continuous cathode contact circuit for electrolytic platin...
Patent number
5,807,469
Issue date
Sep 15, 1998
Intel Corporation
Douglas E. Crafts
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Plating device for wafer
Patent number
5,447,615
Issue date
Sep 5, 1995
Electroplating Engineers Of Japan Limited
Hirofumi Ishida
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Plating device for wafer
Patent number
5,429,733
Issue date
Jul 4, 1995
Electroplating Engineers of Japan, Ltd.
Hirofumi Ishida
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
Information
Patent Application
Cup-shaped plating apparatus
Publication number
20040154917
Publication date
Aug 12, 2004
Hirofumi Ishida
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Wafer plating apparatus
Publication number
20010017105
Publication date
Aug 30, 2001
ELECTROPLATING ENGINEERS OF JAPAN LIMITED
Hirofumi Ishida
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Wafer plating apparatus
Publication number
20010017258
Publication date
Aug 30, 2001
ELECTROPLATING ENGINEERS OF JAPAN LIMITED
Hirofumi Ishida
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR