Hirofumi Kozakai

Person

Shinjuku-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,135,496
- Issue date Nov 5, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,880,130
- Issue date Jan 23, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,650,494
- Issue date May 16, 2023
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,480,867
- Issue date Oct 25, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 11,454,878
- Issue date Sep 27, 2022
- Hoya Corporation
- Hirofumi Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,256,167
- Issue date Feb 22, 2022
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,003,068
- Issue date May 11, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,620,527
- Issue date Apr 14, 2020
- Hoya Corporation
- Kazuhiro Hamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,429,728
- Issue date Oct 1, 2019
- Hoya Corporation
- Kazuhiro Hamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, method for manufacturing same, reflective ma...
- Patent number 10,347,485
- Issue date Jul 9, 2019
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,295,900
- Issue date May 21, 2019
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,001,699
- Issue date Jun 19, 2018
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 9,897,909
- Issue date Feb 20, 2018
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank fo...
- Patent number 9,740,091
- Issue date Aug 22, 2017
- Hoya Corporation
- Takahiro Onoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing substrate with a multilayer reflective film...
- Patent number 9,507,254
- Issue date Nov 29, 2016
- Hoya Corporation
- Toshihiko Orihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 9,494,851
- Issue date Nov 15, 2016
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 9,348,217
- Issue date May 24, 2016
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240103354
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20230244135
- Publication date Aug 3, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...
- Publication number 20220137501
- Publication date May 5, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20210255536
- Publication date Aug 19, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20210247688
- Publication date Aug 12, 2021
- HOYA CORPORATION
- Hirofumi KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...
- Publication number 20200310244
- Publication date Oct 1, 2020
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20190384158
- Publication date Dec 19, 2019
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20190361337
- Publication date Nov 28, 2019
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20180275507
- Publication date Sep 27, 2018
- HOYA CORPORATION
- Toshihiko ORIHARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20180081264
- Publication date Mar 22, 2018
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, METHOD FOR MANUFACTURING SAME, REFLECTIVE MA...
- Publication number 20170263444
- Publication date Sep 14, 2017
- HOYA CORPORATION
- Tsutomu SHOKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20170023853
- Publication date Jan 26, 2017
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20170010527
- Publication date Jan 12, 2017
- HOYA CORPORATION
- Toshihiko ORIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FO...
- Publication number 20160147139
- Publication date May 26, 2016
- HOYA CORPORATION
- Takahiro ONOUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM...
- Publication number 20150205196
- Publication date Jul 23, 2015
- HOYA CORPORATION
- Toshihiko Orihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20150017574
- Publication date Jan 15, 2015
- HOYA CORPORATION
- Toshihiko Orihara
- G02 - OPTICS
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20140329174
- Publication date Nov 6, 2014
- HOYA CORPORATION
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hirofumi Kozakai

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Reflective mask blank, reflective mask and method of manufacturing...

Substrate with a multilayer reflective film, reflective mask blank,...

Reflective mask blank, reflective mask and method of manufacturing...

Substrate with multilayer reflective film, reflective mask blank, r...

Substrate with a multilayer reflective film, reflective mask blank,...

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Reflective mask blank, method for manufacturing same, reflective ma...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Substrate with multilayer reflective film, reflective mask blank fo...

Method of manufacturing substrate with a multilayer reflective film...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

REFLECTIVE MASK BLANK, METHOD FOR MANUFACTURING SAME, REFLECTIVE MA...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FO...

METHOD OF MANUFACTURING SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...