Hirofumi Seki

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Hitachi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method of cleaning the apparatus
- Patent number 6,196,155
- Issue date Mar 6, 2001
- Hitachi, Ltd.
- Eiji Setoyama
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus with a dielectric body in the waveguide
- Patent number 6,084,356
- Issue date Jul 4, 2000
- Hitachi, Ltd.
- Hirofumi Seki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing gas by electron beam
- Patent number 5,939,026
- Issue date Aug 17, 1999
- Hitachi, Ltd.
- Hirofumi Seki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Wafer processing method and ion implantation apparatus
- Publication number 20030211711
- Publication date Nov 13, 2003
- Hirofumi Seki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method of cleaning the apparatus
- Publication number 20010001185
- Publication date May 17, 2001
- Hitachi, Ltd.
- Eiji Setoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...