Hirohito Anze

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam writing method
- Patent number 10,256,073
- Issue date Apr 9, 2019
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist film and charged particle beam writing me...
- Patent number 9,633,820
- Issue date Apr 25, 2017
- NuFlare Technology, Inc.
- Takayuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask manufacturing method, mask substrate, and charged beam drawing...
- Patent number 9,581,893
- Issue date Feb 28, 2017
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 9,147,552
- Issue date Sep 29, 2015
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank and method of manufacturing mask
- Patent number 8,367,276
- Issue date Feb 5, 2013
- Hoya Corporation
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, charged particle beam writing apparatus, an...
- Patent number 8,133,402
- Issue date Mar 13, 2012
- Nuflare Technology, Inc.
- Takayuki Ohnishi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern writing method
- Patent number 6,346,354
- Issue date Feb 12, 2002
- Kabushiki Kaisha Toshiba
- Takayuki Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam lithography system
- Patent number 6,313,476
- Issue date Nov 6, 2001
- Kabushiki Kaisha Toshiba
- Mitsuko Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam lithography method
- Patent number 5,885,747
- Issue date Mar 23, 1999
- Kabushiki Kaisha Toshiba
- Satoshi Yamasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing method for determining optimal exposu...
- Patent number 5,863,682
- Issue date Jan 26, 1999
- Kabushiki Kaisha Toshiba
- Takayuki Abe
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD
- Publication number 20180233324
- Publication date Aug 16, 2018
- NuFlare Technology, Inc.
- Hirohito ANZE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...
- Publication number 20160111253
- Publication date Apr 21, 2016
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK MANUFACTURING METHOD, MASK SUBSTRATE, AND CHARGED BEAM DRAWING...
- Publication number 20150241767
- Publication date Aug 27, 2015
- NuFlare Technology, Inc.
- Hirohito ANZE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20150041671
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Tomoo MOTOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD
- Publication number 20110186744
- Publication date Aug 4, 2011
- NuFlare Technology, Inc.
- Hirohito ANZE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography method of electron beam
- Publication number 20100178611
- Publication date Jul 15, 2010
- NuFlare Technology, Inc.
- Hirohito Anze
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING MASK
- Publication number 20090075185
- Publication date Mar 19, 2009
- HOYA CORPORATION
- Yasushi OKUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...
- Publication number 20080185538
- Publication date Aug 7, 2008
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...
- Publication number 20070243487
- Publication date Oct 18, 2007
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hirohito Anze

Person

Patents Grantslast 30 patents

Charged particle beam writing method

Method for forming resist film and charged particle beam writing me...

Mask manufacturing method, mask substrate, and charged beam drawing...

Charged particle beam writing method and charged particle beam writ...

Mask blank and method of manufacturing mask

Pattern forming method, charged particle beam writing apparatus, an...

Pattern writing method

Charged beam lithography system

Charged beam lithography method

Charged particle beam writing method for determining optimal exposu...

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM WRITING METHOD

METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...

MASK MANUFACTURING METHOD, MASK SUBSTRATE, AND CHARGED BEAM DRAWING...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

CHARGED PARTICLE BEAM APPARATUS AND METHOD

Lithography method of electron beam

MASK BLANK AND METHOD OF MANUFACTURING MASK

PATTERN FORMING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...

FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...