Hiroho Kitada

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck and processing apparatus
- Patent number 11,955,360
- Issue date Apr 9, 2024
- Tocalo Co., Ltd.
- Takeshi Takabatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,482,435
- Issue date Oct 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing based on sensor detection and system learning
- Patent number 8,897,906
- Issue date Nov 25, 2014
- Hitachi High-Technologies Corporation
- Tomohiro Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and operation method thereof
- Patent number 8,828,257
- Issue date Sep 9, 2014
- Hitachi High-Technologies Corporation
- Hiroho Kitada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,569,177
- Issue date Oct 29, 2013
- Hitachi High-Technologies Corporation
- Tomohiro Ohashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC CHUCK AND PROCESSING APPARATUS
- Publication number 20230154780
- Publication date May 18, 2023
- TOCALO CO., LTD.
- Takeshi TAKABATAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190393058
- Publication date Dec 26, 2019
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160027618
- Publication date Jan 28, 2016
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150214083
- Publication date Jul 30, 2015
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130189800
- Publication date Jul 25, 2013
- Tomohiro OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
- Publication number 20130053997
- Publication date Feb 28, 2013
- Tomohiro Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and operation method thereof
- Publication number 20100163403
- Publication date Jul 1, 2010
- Hiroho Kitada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20090321017
- Publication date Dec 31, 2009
- Tsunehiko Tsubone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus including electrostatic chuck with buil...
- Publication number 20090178764
- Publication date Jul 16, 2009
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080314321
- Publication date Dec 25, 2008
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20080023139
- Publication date Jan 31, 2008
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample table and plasma processing apparatus provided with the same
- Publication number 20070267145
- Publication date Nov 22, 2007
- Hiroho Kitada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing system
- Publication number 20070044916
- Publication date Mar 1, 2007
- Masakazu Isozaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck, wafer processing apparatus and plasma processi...
- Publication number 20060291132
- Publication date Dec 28, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Member for plasma processing apparatus and plasma processing apparatus
- Publication number 20060157198
- Publication date Jul 20, 2006
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050193951
- Publication date Sep 8, 2005
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS

Hiroho Kitada

Person

Patents Grantslast 30 patents

Electrostatic chuck and processing apparatus

Plasma processing apparatus

Wafer processing based on sensor detection and system learning

Plasma processing apparatus and operation method thereof

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

ELECTROSTATIC CHUCK AND PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

Plasma processing apparatus and operation method thereof

Plasma Processing Apparatus and Plasma Processing Method

Plasma processing apparatus including electrostatic chuck with buil...

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

Sample table and plasma processing apparatus provided with the same

Vacuum processing system

Electrostatic chuck, wafer processing apparatus and plasma processi...

Member for plasma processing apparatus and plasma processing apparatus

Plasma processing apparatus