Hirokazu SAKAKIBARA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing plated shaped structure and photosensitive res...
- Patent number 11,249,398
- Issue date Feb 15, 2022
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 10,095,110
- Issue date Oct 9, 2018
- JSR Corporation
- Hisanori Akimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 10,025,188
- Issue date Jul 17, 2018
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and method for producing resist pa...
- Patent number 9,417,522
- Issue date Aug 16, 2016
- JSR Corporation
- Hisanori Akimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,335,630
- Issue date May 10, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,298,090
- Issue date Mar 29, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method
- Patent number 9,229,323
- Issue date Jan 5, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,223,207
- Issue date Dec 29, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,170,488
- Issue date Oct 27, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,164,387
- Issue date Oct 20, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,122,163
- Issue date Sep 1, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method
- Patent number 8,993,223
- Issue date Mar 31, 2015
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer
- Patent number 8,980,539
- Issue date Mar 17, 2015
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,968,980
- Issue date Mar 3, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,921,027
- Issue date Dec 30, 2014
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method
- Patent number 8,822,140
- Issue date Sep 2, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,815,493
- Issue date Aug 26, 2014
- JSR Corporation
- Koji Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,795,954
- Issue date Aug 5, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,722,306
- Issue date May 13, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition for forming fine pattern and method for forming f...
- Patent number 8,715,901
- Issue date May 6, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern and developer
- Patent number 8,703,401
- Issue date Apr 22, 2014
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 8,697,331
- Issue date Apr 15, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist pattern-forming method
- Patent number 8,669,042
- Issue date Mar 11, 2014
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer and top coating composition
- Patent number 8,580,482
- Issue date Nov 12, 2013
- JSR Corporation
- Takashi Chiba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming resist pattern
- Patent number 8,530,146
- Issue date Sep 10, 2013
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, fluorine-containing polymer, radiation-sensitive resin co...
- Patent number 8,530,692
- Issue date Sep 10, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Copolymer and top coating composition
- Patent number 7,781,142
- Issue date Aug 24, 2010
- JSR Corporation
- Takashi Chiba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20220026802
- Publication date Jan 27, 2022
- JSR Corporation
- Yuka SANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210325783
- Publication date Oct 21, 2021
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210311391
- Publication date Oct 7, 2021
- JSR Corporation
- Takuhiro TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PLATED SHAPED STRUCTURE AND PHOTOSENSITIVE RES...
- Publication number 20190391489
- Publication date Dec 26, 2019
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170322492
- Publication date Nov 9, 2017
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20170153543
- Publication date Jun 1, 2017
- JSR Corporation
- Hisanori AKIMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160320705
- Publication date Nov 3, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160097978
- Publication date Apr 7, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PA...
- Publication number 20150185604
- Publication date Jul 2, 2015
- JSR Corporation
- Hisanori AKIMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20150177616
- Publication date Jun 25, 2015
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150160556
- Publication date Jun 11, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150050600
- Publication date Feb 19, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140363766
- Publication date Dec 11, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140295350
- Publication date Oct 2, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140255854
- Publication date Sep 11, 2014
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER
- Publication number 20140178825
- Publication date Jun 26, 2014
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20140134544
- Publication date May 15, 2014
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20130337385
- Publication date Dec 19, 2013
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20130323653
- Publication date Dec 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130316287
- Publication date Nov 28, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130295506
- Publication date Nov 7, 2013
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130230803
- Publication date Sep 5, 2013
- JSR Corporation
- Koji ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20130230804
- Publication date Sep 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130224661
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130224666
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN AND DEVELOPER
- Publication number 20120308938
- Publication date Dec 6, 2012
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120202150
- Publication date Aug 9, 2012
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20120183908
- Publication date Jul 19, 2012
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...
- Publication number 20120100480
- Publication date Apr 26, 2012
- JSR Corporation
- Nobuji MATSUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER AND TOP COATING COMPOSITION
- Publication number 20120101205
- Publication date Apr 26, 2012
- JSR Corporation
- Takashi Chiba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hirokazu SAKAKIBARA

Person

Patents Grantslast 30 patents

Photosensitive resin composition, method for forming resist pattern...

Method for producing plated shaped structure and photosensitive res...

Photosensitive resin composition, method for forming resist pattern...

Resist pattern-forming method

Photosensitive resin composition and method for producing resist pa...

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive composition

Resist pattern-forming method

Developer

Radiation-sensitive resin composition and compound

Radiation-sensitive resin composition

Resist pattern-forming method

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Radiation-sensitive resin composition

Resin composition for forming fine pattern and method for forming f...

Method for forming pattern and developer

Compound, polymer, and radiation-sensitive composition

Resist pattern-forming method

Copolymer and top coating composition

Method for forming resist pattern

Compound, fluorine-containing polymer, radiation-sensitive resin co...

Copolymer and top coating composition

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

METHOD FOR PRODUCING PLATED SHAPED STRUCTURE AND PHOTOSENSITIVE RES...

RESIST PATTERN-FORMING METHOD

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PA...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD

DEVELOPER

RESIST PATTERN-FORMING METHOD

NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD

PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

METHOD FOR FORMING PATTERN AND DEVELOPER

RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD

COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...

COPOLYMER AND TOP COATING COMPOSITION