Hiroki IRIUDA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing apparatus and processing method
- Patent number 12,173,405
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas introduction structure and processing apparatus
- Patent number 11,885,024
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method
- Patent number 11,859,285
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical heat treatment apparatus
- Patent number 11,282,721
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depression filling method and processing apparatus
- Patent number 9,574,284
- Issue date Feb 21, 2017
- Tokyo Electron Limited
- Youichirou Chiba
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of forming laminated film and forming apparatus thereof
- Patent number 9,425,040
- Issue date Aug 23, 2016
- Tokyo Electron Limited
- Tomoyuki Obu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20250066916
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS
- Publication number 20220081768
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INTRODUCTION STRUCTURE AND PROCESSING APPARATUS
- Publication number 20220081775
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20220081773
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20220081771
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS
- Publication number 20200058526
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS
- Publication number 20170114464
- Publication date Apr 27, 2017
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPRESSION FILLING METHOD AND PROCESSING APPARATUS
- Publication number 20160240379
- Publication date Aug 18, 2016
- TOKYO ELECTRON LIMITED
- Youichirou CHIBA
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF DEPOSITING SILICON OXIDE FILM AND SILICON NITRIDE FILM AN...
- Publication number 20140308820
- Publication date Oct 16, 2014
- Atsushi ENDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPORT MEMBER AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20140251209
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Tomoyuki OBU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING LAMINATED FILM AND FORMING APPARATUS THEREOF
- Publication number 20140080315
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Tomoyuki OBU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING SILICON OXIDE FILM AND SILICON NITRIDE FILM, F...
- Publication number 20120252224
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Atsushi ENDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL BATCH-TYPE FILM FORMING APPARATUS
- Publication number 20120247391
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Atsushi ENDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroki IRIUDA

Person

Patents Grantslast 30 patents

Processing apparatus and processing method

Gas introduction structure and processing apparatus

Processing apparatus and processing method

Vertical heat treatment apparatus

Depression filling method and processing apparatus

Method of forming laminated film and forming apparatus thereof

Patents Applicationslast 30 patents

PROCESSING APPARATUS AND PROCESSING METHOD

PROCESSING APPARATUS

GAS INTRODUCTION STRUCTURE AND PROCESSING APPARATUS

PROCESSING APPARATUS AND PROCESSING METHOD

PROCESSING APPARATUS AND PROCESSING METHOD

VERTICAL HEAT TREATMENT APPARATUS

VERTICAL HEAT TREATMENT APPARATUS

DEPRESSION FILLING METHOD AND PROCESSING APPARATUS

METHOD OF DEPOSITING SILICON OXIDE FILM AND SILICON NITRIDE FILM AN...

SUPPORT MEMBER AND SEMICONDUCTOR MANUFACTURING APPARATUS

METHOD OF FORMING LAMINATED FILM AND FORMING APPARATUS THEREOF

METHOD OF DEPOSITING SILICON OXIDE FILM AND SILICON NITRIDE FILM, F...

VERTICAL BATCH-TYPE FILM FORMING APPARATUS