Hiroki Kanayama

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for controlling flow and concentration of liquid precursor
- Patent number 8,151,814
- Issue date Apr 10, 2012
- ASM Japan K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-wafer-processing type CVD apparatus
- Patent number 7,462,245
- Issue date Dec 9, 2008
- ASM Japan K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Container Having Multiple Compartments Containing Liquid Material f...
- Publication number 20130014697
- Publication date Jan 17, 2013
- ASM JAPAN K.K.
- Hiroki Kanayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CONTROLLING FLOW AND CONCENTRATION OF LIQUID PRECURSOR
- Publication number 20100178423
- Publication date Jul 15, 2010
- ASM JAPAN K.K.
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TANDEM TYPE SEMICONDUCTOR-PROCESSING APPARATUS
- Publication number 20090162170
- Publication date Jun 25, 2009
- ASM JAPAN K.K.
- Takayuki Yamagishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single-wafer-processing type CVD apparatus
- Publication number 20040011292
- Publication date Jan 22, 2004
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...