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Hiroki NAKATSU
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Tokyo, JP
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last 30 patents
Information
Patent Grant
Composition, pattern-forming method, and compound-producing method
Patent number
11,880,138
Issue date
Jan 23, 2024
JSR Corporation
Shin-ya Nakafuji
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition, film, film-forming method and patterned substrate-prod...
Patent number
11,667,620
Issue date
Jun 6, 2023
JSR Corporation
Hiroki Nakatsu
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Composition for resist underlayer film formation, resist underlayer...
Patent number
11,454,890
Issue date
Sep 27, 2022
JSR Corporation
Naoya Nosaka
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Composition for resist underlayer film formation, resist underlayer...
Patent number
11,402,757
Issue date
Aug 2, 2022
JSR Corporation
Naoya Nosaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Composition for resist underlayer film formation, resist underlayer...
Patent number
11,243,468
Issue date
Feb 8, 2022
JSR Corporation
Naoya Nosaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition for resist underlayer film formation, resist underlayer...
Patent number
11,215,928
Issue date
Jan 4, 2022
JSR Corporation
Kazunori Takanashi
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
Publication number
20240153768
Publication date
May 9, 2024
JSR Corporation
Hiroki NAKATSU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLY...
Publication number
20230416422
Publication date
Dec 28, 2023
JSR Corporation
Hiroki NAKATSU
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLY...
Publication number
20230416451
Publication date
Dec 28, 2023
JSR Corporation
Shuhei YAMADA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
Publication number
20230341778
Publication date
Oct 26, 2023
JSR Corporation
Naoya NOSAKA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COMPOSITION, PATTERN-FORMING METHOD, AND COMPOUND-PRODUCING METHOD
Publication number
20210157235
Publication date
May 27, 2021
JSR Corporation
Shin-ya NAKAFUJI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
Publication number
20200272053
Publication date
Aug 27, 2020
JSR Corporation
Naoya NOSAKA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
COMPOSITION, FILM, FILM-FORMING METHOD AND PATTERNED SUBSTRATE-PROD...
Publication number
20200199093
Publication date
Jun 25, 2020
JSR Corporation
Hiroki NAKATSU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
Publication number
20200012193
Publication date
Jan 9, 2020
JSR Corporation
Naoya NOSAKA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
Publication number
20190212650
Publication date
Jul 11, 2019
JSR Corporation
Kazunori TAKANASHI
H01 - BASIC ELECTRIC ELEMENTS