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Hiroki Nonaka

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  • Joetsu-shi, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    • Publication number 20230114441
    • Publication date Apr 13, 2023
    • Shin-Etsu Chemical Co., Ltd.
    • Jun Hatakeyama
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    • Publication number 20230076505
    • Publication date Mar 9, 2023
    • Shin-Etsu Chemical Co., Ltd.
    • Jun Hatakeyama
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    RESIST MATERIAL AND PATTERNING PROCESS
    • Publication number 20210063873
    • Publication date Mar 4, 2021
    • Shin-Etsu Chemical Co., Ltd.
    • Tomohiro Kobayashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST MATERIAL AND PATTERNING PROCESS
    • Publication number 20210063871
    • Publication date Mar 4, 2021
    • Shin-Etsu Chemical Co., Ltd.
    • Tomohiro Kobayashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY