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Hiroki Ootera

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Patents Grantslast 30 patents

  • Information Patent Grant

    Semiconductor device
    • Patent number 6,787,874
    • Issue date Sep 7, 2004
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroki Ootera
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of fabricating a semiconductor device including time-selecti...
    • Patent number 6,756,312
    • Issue date Jun 29, 2004
    • Mitsubishi Denki Kabushiki Kaisha
    • Kenji Shintani
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,417,111
    • Issue date Jul 9, 2002
    • Mitsubishi Denki Kabushiki Kaisha
    • Kazuyasu Nishikawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma generating apparatus
    • Patent number 6,335,595
    • Issue date Jan 1, 2002
    • Mitsubishi Denki Kabushiki Kaisha
    • Kazuyasu Nishikawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,244,211
    • Issue date Jun 12, 2001
    • Mitsubishi Denki Kabushiki Kaisha
    • Kazuyasu Nishikawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Two chamber plasma processing apparatus
    • Patent number 6,167,835
    • Issue date Jan 2, 2001
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroki Ootera
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus using a partition panel
    • Patent number 6,076,483
    • Issue date Jun 20, 2000
    • Mitsubishi Denki Kabushiki Kaisha
    • Kenji Shintani
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,020,570
    • Issue date Feb 1, 2000
    • Mitsubishi Denki Kabushiki Kaisha
    • Masakazu Taki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 5,733,405
    • Issue date Mar 31, 1998
    • Mitsubishi Denki Kabushiki Kaisha
    • Masakazu Taki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processor
    • Patent number 5,146,138
    • Issue date Sep 8, 1992
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroki Ootera
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processor
    • Patent number 5,115,167
    • Issue date May 19, 1992
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroki Ootera
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processor
    • Patent number 4,947,085
    • Issue date Aug 7, 1990
    • Mitsubishi Denki Kabushiki Kaisha
    • Koichiro Nakanishi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Apparatus for uniformly distributing plasma over a substrate
    • Patent number 4,894,510
    • Issue date Jan 16, 1990
    • Mitsubishi Denki Kabushiki Kaisha
    • Koichiro Nakanishi
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    SEMICONDUCTOR DEVICE
    • Publication number 20030107061
    • Publication date Jun 12, 2003
    • Mitsubishi Denki Kabushiki Kaisha
    • Hiroki Ootera
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus
    • Publication number 20020088542
    • Publication date Jul 11, 2002
    • Kazuyasu Nishikawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Method of fabricating semiconductor device and wafer treatment appa...
    • Publication number 20020052120
    • Publication date May 2, 2002
    • Mitsubishi Denki Kabushiki Kaisha
    • Kenji Shintani
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Plasma generating apparatus
    • Publication number 20020047544
    • Publication date Apr 25, 2002
    • Mitsubishi Denki Kabushiki Kaisha
    • Kazuyasu Nishikawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    Plasma processing apparatus
    • Publication number 20010050144
    • Publication date Dec 13, 2001
    • Kazuyasu Nishikawa
    • H01 - BASIC ELECTRIC ELEMENTS