Hiroki Taniyama

Person

Saga, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing apparatus and substrate processing method
- Patent number 7,387,131
- Issue date Jun 17, 2008
- Tokyo Electron Limited
- Osamu Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus, processing system and processing method
- Patent number 6,827,814
- Issue date Dec 7, 2004
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid treatment system and liquid treatment method
- Patent number 6,634,370
- Issue date Oct 21, 2003
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for processing substrate
- Patent number 6,589,338
- Issue date Jul 8, 2003
- Tokyo Electron Limited
- Mitsunori Nakamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate transport and apparatus
- Patent number 6,520,733
- Issue date Feb 18, 2003
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for washing substrate
- Patent number 6,431,184
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Hiroki Taniyama
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus and method
- Patent number 6,357,457
- Issue date Mar 19, 2002
- Tokyo Electron Limited
- Hiroki Taniyama
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning both sides of substrate
- Patent number 6,276,378
- Issue date Aug 21, 2001
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Washing/drying process apparatus and washing/drying process method
- Patent number 6,247,479
- Issue date Jun 19, 2001
- Tokyo Electron Limited
- Hiroki Taniyama
- B08 - CLEANING
Information Patent Grant
Substrate transport method and apparatus, and substrate processing...
- Patent number 6,245,156
- Issue date Jun 12, 2001
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for cleaning both sides of substrate
- Patent number 6,115,867
- Issue date Sep 12, 2000
- Tokyo Electron Limited
- Satoshi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for wet etching of thin film
- Patent number 6,096,233
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for washing wafers
- Patent number 5,421,905
- Issue date Jun 6, 1995
- Tokyo Electron Limited
- Kinya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Washing apparatus
- Patent number 5,261,431
- Issue date Nov 16, 1993
- Tokyo Electron Limited
- Kinya Ueno
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Processing apparatus, processing system and processing method
- Publication number 20010037858
- Publication date Nov 8, 2001
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS

Hiroki Taniyama

Person

Patents Grantslast 30 patents

Processing apparatus and substrate processing method

Processing apparatus, processing system and processing method

Liquid treatment system and liquid treatment method

Device for processing substrate

Substrate transport and apparatus

Apparatus and method for washing substrate

Substrate cleaning apparatus and method

Apparatus for cleaning both sides of substrate

Washing/drying process apparatus and washing/drying process method

Substrate transport method and apparatus, and substrate processing...

Apparatus for cleaning both sides of substrate

Method for wet etching of thin film

Method for washing wafers

Washing apparatus

Patents Applicationslast 30 patents

Processing apparatus, processing system and processing method