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Hirokuni Asamizu
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Kyoto, JP
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Patents Grants
last 30 patents
Information
Patent Grant
SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer...
Patent number
10,876,220
Issue date
Dec 29, 2020
Rohm Co., Ltd.
Hirokuni Asamizu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer...
Patent number
10,570,529
Issue date
Feb 25, 2020
Rohm Co., Ltd.
Hirokuni Asamizu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer...
Patent number
10,323,335
Issue date
Jun 18, 2019
Rohm Co., Ltd.
Hirokuni Asamizu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Ohmic electrode, method of manufacturing the same and semiconductor...
Patent number
6,365,969
Issue date
Apr 2, 2002
Sumitomo Electric Industries, Ltd.
Akira Yamaguchi
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
SIC EPITAXIAL WAFER, MANUFACTURING APPARATUS OF SIC EPITAXIAL WAFER...
Publication number
20200149188
Publication date
May 14, 2020
ROHM CO., LTD.
Hirokuni ASAMIZU
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SIC EPITAXIAL WAFER, MANUFACTURING APPARATUS OF SIC EPITAXIAL WAFER...
Publication number
20190257001
Publication date
Aug 22, 2019
Rohm Co., Ltd.
Hirokuni ASAMIZU
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SIC EPITAXIAL WAFER, MANUFACTURING APPARATUS OF SIC EPITAXIAL WAFER...
Publication number
20180202070
Publication date
Jul 19, 2018
Rohm Co., Ltd.
Hirokuni ASAMIZU
C30 - CRYSTAL GROWTH
Information
Patent Application
NITRIDE BASED SEMICONDUCTOR DEVICE
Publication number
20160064488
Publication date
Mar 3, 2016
Rohm Co., Ltd.
Shinya TAKADO
H01 - BASIC ELECTRIC ELEMENTS