Hirokuni Saito

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,703,757
- Issue date Jul 18, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,411,224
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,577
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern and resist composition
- Patent number 8,877,432
- Issue date Nov 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,486,605
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200409259
- Publication date Dec 31, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi TAKAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200409264
- Publication date Dec 31, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Makoto SAKATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130017500
- Publication date Jan 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120183899
- Publication date Jul 19, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20110262872
- Publication date Oct 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100190108
- Publication date Jul 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hirokuni Saito

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Method of forming resist pattern and resist composition

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN