Hiromasa MOCHIKI

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching processing method
- Patent number 9,496,150
- Issue date Nov 15, 2016
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method
- Patent number 9,373,521
- Issue date Jun 21, 2016
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate and substrate processing apparatus
- Patent number 9,136,097
- Issue date Sep 15, 2015
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,685,267
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method and storage medium
- Patent number 8,641,916
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, plasma etching apparatus and storage medium
- Patent number 8,383,001
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for uniformity control in ballistic electron beam...
- Patent number 7,829,469
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas setting method, gas setting apparatus, etching apparatus and su...
- Patent number 7,723,236
- Issue date May 25, 2010
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for etching a high-k dielectric material
- Patent number 7,709,397
- Issue date May 4, 2010
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for etching a film stack
- Patent number 7,172,969
- Issue date Feb 6, 2007
- Tokyo Electron Limited
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150194441
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSING METHOD
- Publication number 20150170933
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Hiromasa MOCHIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20110318933
- Publication date Dec 29, 2011
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSING METHOD
- Publication number 20110244691
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Hiromasa MOCHIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND STORAGE MEDIUM
- Publication number 20100213162
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM
- Publication number 20100190350
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090120582
- Publication date May 14, 2009
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR UNIFORMITY CONTROL IN BALLISTIC ELECTRON BEAM...
- Publication number 20080135518
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas setting method, gas setting apparatus, etching apparatus and su...
- Publication number 20060157445
- Publication date Jul 20, 2006
- TOKYO ELECTRON LIMITED
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a gate stack
- Publication number 20060049139
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a film stack
- Publication number 20060051964
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a high-k dielectric material
- Publication number 20050164511
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS

Hiromasa MOCHIKI

Person

Patents Grantslast 30 patents

Etching processing method

Etching processing method

Shower plate and substrate processing apparatus

Substrate processing method

Plasma etching apparatus, plasma etching method and storage medium

Plasma etching method, plasma etching apparatus and storage medium

Method and system for uniformity control in ballistic electron beam...

Gas setting method, gas setting apparatus, etching apparatus and su...

Method and system for etching a high-k dielectric material

Method and system for etching a film stack

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

ETCHING PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

ETCHING PROCESSING METHOD

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND STORAGE MEDIUM

PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM

SHOWER PLATE AND SUBSTRATE PROCESSING APPARATUS

METHOD AND SYSTEM FOR UNIFORMITY CONTROL IN BALLISTIC ELECTRON BEAM...

Gas setting method, gas setting apparatus, etching apparatus and su...

Method and system for etching a gate stack

Method and system for etching a film stack

Method and system for etching a high-k dielectric material