Hiromasa Yamanashi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Specimen potential measuring method, and charged particle beam device
- Patent number 9,129,775
- Issue date Sep 8, 2015
- Hitachi High-Technologies Corporation
- Tatsuaki Ishijima
- G01 - MEASURING TESTING
Information Patent Grant
Pattern evaluation method, device therefor, and electron beam device
- Patent number 8,816,277
- Issue date Aug 26, 2014
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device
- Patent number 8,766,183
- Issue date Jul 1, 2014
- Hitachi High-Technologies Corporation
- Muneyuki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 8,704,175
- Issue date Apr 22, 2014
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and control method therefor
- Patent number 8,026,482
- Issue date Sep 27, 2011
- Hitachi High-Technologies Corporation
- Muneyuki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology system of fine pattern for process control by charged par...
- Patent number 7,679,056
- Issue date Mar 16, 2010
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and pattern measuring method
- Patent number 7,655,907
- Issue date Feb 2, 2010
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Scanning Electron Microscope
- Publication number 20130175447
- Publication date Jul 11, 2013
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE
- Publication number 20130026361
- Publication date Jan 31, 2013
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20120119085
- Publication date May 17, 2012
- Hitachi High-Technologies Corporation
- Tatsuaki Ishijima
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Device
- Publication number 20110147586
- Publication date Jun 23, 2011
- Muneyuki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREFOR
- Publication number 20090140143
- Publication date Jun 4, 2009
- Muneyuki FUKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus and pattern measuring method
- Publication number 20070272858
- Publication date Nov 29, 2007
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology System of Fine pattern for Process Control by Charged Par...
- Publication number 20070221844
- Publication date Sep 27, 2007
- Hiromasa Yamanashi
- G01 - MEASURING TESTING

Hiromasa Yamanashi

Person

Patents Grantslast 30 patents

Specimen potential measuring method, and charged particle beam device

Pattern evaluation method, device therefor, and electron beam device

Charged particle beam device

Scanning electron microscope

Charged particle beam apparatus and control method therefor

Metrology system of fine pattern for process control by charged par...

Charged particle beam apparatus and pattern measuring method

Patents Applicationslast 30 patents

Scanning Electron Microscope

PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE

SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam Device

CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREFOR

Charged particle beam apparatus and pattern measuring method

Metrology System of Fine pattern for Process Control by Charged Par...