Hiromi Kanda

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin for hydrophobilizing resist surface, method for production th...
- Patent number 10,678,132
- Issue date Jun 9, 2020
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, resin used for the positive resist com...
- Patent number 9,709,891
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 9,541,831
- Issue date Jan 10, 2017
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pigment dispersion composition, photocurable composition and color...
- Patent number 9,442,372
- Issue date Sep 13, 2016
- FUJIFILM Corporation
- Hiromi Kanda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, resin used for the positive resist com...
- Patent number 9,081,279
- Issue date Jul 14, 2015
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 9,057,952
- Issue date Jun 16, 2015
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 9,023,576
- Issue date May 5, 2015
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method
- Patent number 8,945,810
- Issue date Feb 3, 2015
- FUJIFILM Corporation
- Fumiyuki Nishiyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 8,871,421
- Issue date Oct 28, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 8,808,975
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method using the same
- Patent number 8,741,537
- Issue date Jun 3, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,697,329
- Issue date Apr 15, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition, resin used for the positive resist com...
- Patent number 8,679,724
- Issue date Mar 25, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,426,109
- Issue date Apr 23, 2013
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, pattern-forming method using the photos...
- Patent number 8,426,101
- Issue date Apr 23, 2013
- FUJIFILM Corporation
- Kenji Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 8,389,200
- Issue date Mar 5, 2013
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pigment-dispersed composition, colored photosensitive composition,...
- Patent number 8,362,140
- Issue date Jan 29, 2013
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition and pattern forming method
- Patent number 8,343,708
- Issue date Jan 1, 2013
- FUJIFILM Corporation
- Toshiaki Fukuhara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method using the same
- Patent number 8,241,833
- Issue date Aug 14, 2012
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resin for hydrophobitizing resist surface, method for manufacturing...
- Patent number 8,080,363
- Issue date Dec 20, 2011
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,039,197
- Issue date Oct 18, 2011
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming method
- Patent number 8,034,537
- Issue date Oct 11, 2011
- FUJIFILM Corporation
- Toshiaki Fukuhara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method
- Patent number 7,998,654
- Issue date Aug 16, 2011
- FUJIFILM Corporation
- Fumiyuki Nishiyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 7,947,421
- Issue date May 24, 2011
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 7,906,268
- Issue date Mar 15, 2011
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method
- Patent number 7,892,722
- Issue date Feb 22, 2011
- FUJIFILM Corporation
- Haruki Inabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 7,842,452
- Issue date Nov 30, 2010
- FUJIFILM Corporation
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method using the same
- Patent number 7,811,740
- Issue date Oct 12, 2010
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 7,803,511
- Issue date Sep 28, 2010
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern making method using the same
- Patent number 7,790,351
- Issue date Sep 7, 2010
- FUJIFILM Corporation
- Toshiaki Fukuhara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20170123318
- Publication date May 4, 2017
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20150185609
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COM...
- Publication number 20150168838
- Publication date Jun 18, 2015
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COM...
- Publication number 20140134541
- Publication date May 15, 2014
- FUJIFILM CORPORATION
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20130177850
- Publication date Jul 11, 2013
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20120115085
- Publication date May 10, 2012
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20120034564
- Publication date Feb 9, 2012
- FUJIFILM CORPORATION
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20120015293
- Publication date Jan 19, 2012
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20110305991
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...
- Publication number 20110076622
- Publication date Mar 31, 2011
- FUJIFILM CORPORATION
- Haruki Inabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PIGMENT-DISPERSED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION,...
- Publication number 20110014401
- Publication date Jan 20, 2011
- FUJIFILM Corporation
- Kazuhiro Fujimaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...
- Publication number 20100310991
- Publication date Dec 9, 2010
- FUJIFILM CORPORATION
- Haruki INABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME
- Publication number 20100297553
- Publication date Nov 25, 2010
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20100112477
- Publication date May 6, 2010
- FUJIFILM CORPORATION
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100068661
- Publication date Mar 18, 2010
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN FOR HYDROPHOBITIZING RESIST SURFACE, METHOD FOR MANUFACTURING...
- Publication number 20090239176
- Publication date Sep 24, 2009
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20090181323
- Publication date Jul 16, 2009
- FUJIFILM CORPORATION
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN MAKING METHOD USING THE SAME
- Publication number 20090136870
- Publication date May 28, 2009
- FUJIFILM Corporation
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20090123880
- Publication date May 14, 2009
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20090098485
- Publication date Apr 16, 2009
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PIGMENT DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND COLOR...
- Publication number 20090082487
- Publication date Mar 26, 2009
- FUJIFILM CORPORATION
- Hiromi KANDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20080305433
- Publication date Dec 11, 2008
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20080248425
- Publication date Oct 9, 2008
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20080248421
- Publication date Oct 9, 2008
- FUJIFILM CORPORATION
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20080241746
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Toshiaki FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN FOR HYDROPHOBILIZING RESIST SURFACE, METHOD FOR PRODUCTION TH...
- Publication number 20080227025
- Publication date Sep 18, 2008
- FUJIFILM CORPORATION
- Hiromi KANDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080171287
- Publication date Jul 17, 2008
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of pattern formation with th...
- Publication number 20070178405
- Publication date Aug 2, 2007
- Fuji Photo Film Co., Ltd.
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method
- Publication number 20070172769
- Publication date Jul 26, 2007
- FUJIFILM CORPORATION
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method
- Publication number 20070172768
- Publication date Jul 26, 2007
- FUJIFILM CORPORATION
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiromi Kanda

Person

Patents Grantslast 30 patents

Resin for hydrophobilizing resist surface, method for production th...

Positive resist composition, resin used for the positive resist com...

Positive resist composition and method of pattern formation with th...

Pigment dispersion composition, photocurable composition and color...

Positive resist composition, resin used for the positive resist com...

Positive resist composition and method of pattern formation with th...

Positive resist composition for immersion exposure and pattern-form...

Positive resist composition and pattern-forming method

Positive resist composition and method of pattern formation with th...

Positive resist composition for immersion exposure and pattern-form...

Positive resist composition and pattern-forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition, resin used for the positive resist com...

Positive type resist composition for use in liquid immersion exposu...

Photosensitive composition, pattern-forming method using the photos...

Pattern forming method

Pigment-dispersed composition, colored photosensitive composition,...

Positive resist composition and pattern forming method

Positive resist composition and pattern-forming method using the same

Resin for hydrophobitizing resist surface, method for manufacturing...

Positive type resist composition for use in liquid immersion exposu...

Positive resist composition and pattern forming method

Positive resist composition and pattern-forming method

Positive resist composition for immersion exposure and pattern-form...

Positive resist composition for immersion exposure and pattern-form...

Pattern forming method

Pattern forming method

Positive resist composition and pattern-forming method using the same

Positive resist composition for immersion exposure and pattern-form...

Positive resist composition and pattern making method using the same

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COM...

POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COM...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...

PIGMENT-DISPERSED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION,...

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...

POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

PATTERN FORMING METHOD

RESIN FOR HYDROPHOBITIZING RESIST SURFACE, METHOD FOR MANUFACTURING...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION AND PATTERN MAKING METHOD USING THE SAME

PATTERN FORMING METHOD

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PIGMENT DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND COLOR...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

RESIN FOR HYDROPHOBILIZING RESIST SURFACE, METHOD FOR PRODUCTION TH...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Positive resist composition and method of pattern formation with th...

Pattern forming method

Pattern forming method