Hiromitsu Kambara

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Austin, TX, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for etching a high-k dielectric material
- Patent number 7,709,397
- Issue date May 4, 2010
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system for treating a substrate
- Patent number 7,396,431
- Issue date Jul 8, 2008
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of trimming a gate electrode structure
- Patent number 6,852,584
- Issue date Feb 8, 2005
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing system for treating a substrate
- Publication number 20060065367
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20050227494
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Fumihiko Higuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a high-k dielectric material
- Publication number 20050164511
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS