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Hiromitsu Kambara
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Austin, JP
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last 30 patents
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Patent Grant
Pattern enhancement using a gas cluster ion beam
Patent number
11,694,872
Issue date
Jul 4, 2023
TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
Kazuya Dobashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pattern enhancement using a gas cluster ion beam
Patent number
11,450,506
Issue date
Sep 20, 2022
TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
Kazuya Dobashi
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
Publication number
20220277924
Publication date
Sep 1, 2022
TEL Manufacturing and Engineering of America, Inc.
Kazuya Dobashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Pattern Enhancement Using a Gas Cluster Ion Beam
Publication number
20210335568
Publication date
Oct 28, 2021
TOKYO ELECTRON LIMITED
Kazuya Dobashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and system for etching a high-k dielectric material
Publication number
20050118353
Publication date
Jun 2, 2005
TOKYO ELECTRON LIMITED
Lee Chen
H01 - BASIC ELECTRIC ELEMENTS