Hiromitsu Nakashima

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 11,603,459
- Issue date Mar 14, 2023
- JSR Corporation
- Tomohiko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 11,130,856
- Issue date Sep 28, 2021
- JSR Corporation
- Tomohiko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,036,133
- Issue date Jun 15, 2021
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,620,534
- Issue date Apr 14, 2020
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method
- Patent number 10,564,546
- Issue date Feb 18, 2020
- JSR Corporation
- Tomohiko Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,082,733
- Issue date Sep 25, 2018
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 10,048,586
- Issue date Aug 14, 2018
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and method for formi...
- Patent number 9,598,520
- Issue date Mar 21, 2017
- JSR Corporation
- Yuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,500,950
- Issue date Nov 22, 2016
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and resist pattern-forming method
- Patent number 9,268,219
- Issue date Feb 23, 2016
- JSR Corporation
- Hiromu Miyata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,213,236
- Issue date Dec 15, 2015
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and pattern-forming method
- Patent number 9,158,196
- Issue date Oct 13, 2015
- JSR Corporation
- Kazuki Kasahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming resist underlayer film and pattern-forming...
- Patent number 9,116,427
- Issue date Aug 25, 2015
- JSR Corporation
- Shunsuke Kurita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
- Patent number 9,046,765
- Issue date Jun 2, 2015
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,895,223
- Issue date Nov 25, 2014
- JSR Corporation
- Mitsuo Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for formation of upper layer film, and method for forma...
- Patent number 8,895,229
- Issue date Nov 25, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 8,697,343
- Issue date Apr 15, 2014
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, polymer and compound
- Patent number 8,609,321
- Issue date Dec 17, 2013
- JSP Corporation
- Hiromitsu Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,609,318
- Issue date Dec 17, 2013
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist film formed using...
- Patent number 8,609,319
- Issue date Dec 17, 2013
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lactone copolymer and radiation-sensitive resin composition
- Patent number 8,597,867
- Issue date Dec 3, 2013
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Upper layer film forming composition and method of forming photores...
- Patent number 8,507,189
- Issue date Aug 13, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,435,718
- Issue date May 7, 2013
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,273,521
- Issue date Sep 25, 2012
- JSR Corporation
- Mitsuo Sato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer and positive-tone radiation-sensitive resin composition
- Patent number 8,182,977
- Issue date May 22, 2012
- JSR Corporation
- Norihiko Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,076,053
- Issue date Dec 13, 2011
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220299873
- Publication date Sep 22, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20220260908
- Publication date Aug 18, 2022
- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210388197
- Publication date Dec 16, 2021
- JSR Corporation
- Tomohiko SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210389671
- Publication date Dec 16, 2021
- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20210364918
- Publication date Nov 25, 2021
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20210278764
- Publication date Sep 9, 2021
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20200124961
- Publication date Apr 23, 2020
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190278175
- Publication date Sep 12, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190249000
- Publication date Aug 15, 2019
- JSR Corporation
- Tomohiko SAKURAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190025695
- Publication date Jan 24, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170329228
- Publication date Nov 16, 2017
- JSR Corporation
- Tomohiko SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20170199453
- Publication date Jul 13, 2017
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20160062237
- Publication date Mar 3, 2016
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20140162190
- Publication date Jun 12, 2014
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
- Publication number 20140023968
- Publication date Jan 23, 2014
- JSR Corporation
- Hiromitsu NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...
- Publication number 20130233825
- Publication date Sep 12, 2013
- JSR Corporation
- Shunsuke KURITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130216948
- Publication date Aug 22, 2013
- JSR Corporation
- Kazuki KASAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
- Publication number 20130189621
- Publication date Jul 25, 2013
- JSR Corporation
- Hiromitsu NAKASHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20130089817
- Publication date Apr 11, 2013
- JSR Corporation
- Hiromu MIYATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20130022912
- Publication date Jan 24, 2013
- JSR Corporation
- Mitsuo SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...
- Publication number 20120295197
- Publication date Nov 22, 2012
- JSR Corporation
- Yuko KIRIDOSHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120219903
- Publication date Aug 30, 2012
- JSR Corporation
- Mitsuo SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...
- Publication number 20120082935
- Publication date Apr 5, 2012
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120034560
- Publication date Feb 9, 2012
- JSR Corporation
- Kazuo NAKAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD
- Publication number 20120028198
- Publication date Feb 2, 2012
- JSR Corporation
- Atsushi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110223537
- Publication date Sep 15, 2011
- JSR Corporation
- Takuma Ebata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hiromitsu Nakashima

Person

Patents Grantslast 30 patents

Fluorine-containing polymer, purification method, and radiation-sen...

Resin composition and method of forming resist pattern

Resin composition and method of forming resist pattern

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Resist pattern-forming method

Fluorine-containing polymer, purification method, and radiation-sen...

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, polymer and method for formi...

Radiation-sensitive resin composition, method for forming resist pa...

Fluorine-containing polymer, purification method, and radiation-sen...

Photoresist composition and resist pattern-forming method

Fluorine-containing polymer, purification method, and radiation-sen...

Radiation-sensitive resin composition and pattern-forming method

Composition for forming resist underlayer film and pattern-forming...

Resist pattern-forming method, resist pattern-forming radiation-sen...

Radiation-sensitive resin composition

Composition for formation of upper layer film, and method for forma...

Radiation-sensitive resin composition, method for forming resist pa...

Fluorine-containing polymer, purification method, and radiation-sen...

Radiation-sensitive resin composition, polymer and compound

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and resist film formed using...

Lactone copolymer and radiation-sensitive resin composition

Upper layer film forming composition and method of forming photores...

Upper layer-forming composition and photoresist patterning method

Radiation-sensitive resin composition and compound

Polymer and positive-tone radiation-sensitive resin composition

Upper layer-forming composition and photoresist patterning method

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RESIST PATTERN-FORMING METHOD

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND

PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER