Hiromitsu Nanba

Person

Tosu-city, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,490,424
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching method, substrate liquid processing apparatus, and stor...
- Patent number 10,431,448
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and rec...
- Patent number 10,403,518
- Issue date Sep 3, 2019
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and method
- Patent number 8,479,753
- Issue date Jul 9, 2013
- Tokyo Electron Limited
- Hiromitsu Nanba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid processing apparatus
- Patent number 8,444,772
- Issue date May 21, 2013
- Tokyo Electron Limited
- Norihiro Itoh
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and dr...
- Patent number 8,152,933
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning apparatus and compute...
- Patent number 8,113,221
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Hiromitsu Nanba
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,051,862
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus and method and computer readable medium
- Patent number 8,043,440
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,043,467
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 7,998,308
- Issue date Aug 16, 2011
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning apparatus and compute...
- Patent number 7,927,429
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Hiromitsu Nanba
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus
- Patent number 7,793,610
- Issue date Sep 14, 2010
- Tokyo Electron Limited
- Masami Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 7,749,333
- Issue date Jul 6, 2010
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method
- Patent number 7,699,939
- Issue date Apr 20, 2010
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 7,354,484
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 7,275,553
- Issue date Oct 2, 2007
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20200016623
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20190080934
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Hiromitsu NANBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND REC...
- Publication number 20180269076
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCHING METHOD, SUBSTRATE LIQUID PROCESSING APPARATUS, AND STOR...
- Publication number 20180012754
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, DEPOSIT REMOVING METHOD OF SUBSTRAT...
- Publication number 20150323250
- Publication date Nov 12, 2015
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND COMPUTE...
- Publication number 20110155193
- Publication date Jun 30, 2011
- TOKYO ELECTRON LIMITED
- Hiromitsu NANBA
- B08 - CLEANING
Information Patent Application
Substrate Processing Apparatus, Substrate Processing Method, and Dr...
- Publication number 20100212701
- Publication date Aug 26, 2010
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus and liquid Processing Method
- Publication number 20100144158
- Publication date Jun 10, 2010
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20090205155
- Publication date Aug 20, 2009
- TOKYO ELECTRON LIMITED
- Norihiro ITOH
- B08 - CLEANING
Information Patent Application
Substrate processing apparatus and method
- Publication number 20090056766
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning apparatus and method and computer readable medium
- Publication number 20080173333
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus and liquid processing method
- Publication number 20080006299
- Publication date Jan 10, 2008
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus and method
- Publication number 20070289528
- Publication date Dec 20, 2007
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid processing apparatus
- Publication number 20070240638
- Publication date Oct 18, 2007
- TOKYO ELECTRON LIMITED
- Masami Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus
- Publication number 20070240824
- Publication date Oct 18, 2007
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus and liquid processing method
- Publication number 20070231483
- Publication date Oct 4, 2007
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method and substrate cleaning apparatus
- Publication number 20070137677
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method, substrate cleaning apparatus and compute...
- Publication number 20070131256
- Publication date Jun 14, 2007
- Hiromitsu Nanba
- B08 - CLEANING
Information Patent Application
Liquid processing apparatus and liquid processing method
- Publication number 20030226577
- Publication date Dec 11, 2003
- Takehiko Orll
- H01 - BASIC ELECTRIC ELEMENTS

Hiromitsu Nanba

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, and st...

Wet etching method, substrate liquid processing apparatus, and stor...

Substrate processing method, substrate processing apparatus and rec...

Liquid processing apparatus and method

Liquid processing apparatus

Substrate processing apparatus, substrate processing method, and dr...

Substrate cleaning method, substrate cleaning apparatus and compute...

Liquid processing apparatus and liquid processing method

Cleaning apparatus and method and computer readable medium

Liquid processing apparatus and liquid processing method

Liquid processing apparatus

Substrate cleaning method, substrate cleaning apparatus and compute...

Liquid processing apparatus

Substrate processing apparatus and method

Substrate cleaning method

Liquid processing apparatus and liquid processing method

Liquid processing apparatus and liquid processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND REC...

WET ETCHING METHOD, SUBSTRATE LIQUID PROCESSING APPARATUS, AND STOR...

SUBSTRATE PROCESSING APPARATUS, DEPOSIT REMOVING METHOD OF SUBSTRAT...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND COMPUTE...

Substrate Processing Apparatus, Substrate Processing Method, and Dr...

Liquid Processing Apparatus and liquid Processing Method

LIQUID PROCESSING APPARATUS

Substrate processing apparatus and method

Cleaning apparatus and method and computer readable medium

Liquid processing apparatus and liquid processing method

Liquid processing apparatus and method

Liquid processing apparatus

Liquid processing apparatus

Liquid processing apparatus and liquid processing method

Substrate cleaning method and substrate cleaning apparatus

Substrate cleaning method, substrate cleaning apparatus and compute...

Liquid processing apparatus and liquid processing method