Hiromitsu Tsuji

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method for a process of liquid immersion lithography
- Patent number 8,409,360
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for measuring liquid immersion lithography soluble fraction...
- Patent number 7,924,400
- Issue date Apr 12, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Nobuyuki Kohda
- G01 - MEASURING TESTING
Information Patent Grant
Photoresist composition and resist pattern formation method by the...
- Patent number 7,700,257
- Issue date Apr 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition, and low-molecular compound and high-molecu...
- Patent number 7,592,122
- Issue date Sep 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, resist composition and dissolution inhibitor agen...
- Patent number 7,326,512
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for liquid immersion exposure process and method...
- Patent number 7,264,918
- Issue date Sep 4, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Cleaning liquid and a cleaning method
- Publication number 20110056511
- Publication date Mar 10, 2011
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR RESIST PAT...
- Publication number 20100028799
- Publication date Feb 4, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiromitsu Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING LIQUID IMMERSION LITHOGRAPHY SOLUBLE FRACTION...
- Publication number 20090268173
- Publication date Oct 29, 2009
- Nobuyuki Kohda
- G01 - MEASURING TESTING
Information Patent Application
Positive Resist Composition For Immersion Exposure and Method of Fo...
- Publication number 20080193871
- Publication date Aug 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming resist pattern
- Publication number 20070190447
- Publication date Aug 16, 2007
- Tokyo Ohkakogyo Co. LTD.
- Toshiyuki Ogata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photoresist composition and method of forming resist pattern
- Publication number 20070148581
- Publication date Jun 28, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hiromitsu Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and, used in the photoresist composition, l...
- Publication number 20060210913
- Publication date Sep 21, 2006
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist composition and method for forming resist pattern using...
- Publication number 20060166130
- Publication date Jul 27, 2006
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for liquid immersion exposure process and method...
- Publication number 20060154170
- Publication date Jul 13, 2006
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist composition and dissolution inhibitor agen...
- Publication number 20050130056
- Publication date Jun 16, 2005
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hiromitsu Tsuji

Person

Patents Grantslast 30 patents

Cleaning method for a process of liquid immersion lithography

Method for measuring liquid immersion lithography soluble fraction...

Photoresist composition and resist pattern formation method by the...

Photoresist composition, and low-molecular compound and high-molecu...

Polymer compound, resist composition and dissolution inhibitor agen...

Resist composition for liquid immersion exposure process and method...

Patents Applicationslast 30 patents

Cleaning liquid and a cleaning method

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR RESIST PAT...

METHOD FOR MEASURING LIQUID IMMERSION LITHOGRAPHY SOLUBLE FRACTION...

Positive Resist Composition For Immersion Exposure and Method of Fo...

Photoresist composition and method of forming resist pattern

Photoresist composition and method of forming resist pattern

Photoresist composition and, used in the photoresist composition, l...

Photoresist composition and method for forming resist pattern using...

Resist composition for liquid immersion exposure process and method...

Polymer compound, resist composition and dissolution inhibitor agen...