Hiromu MIYATA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 9,760,004
- Issue date Sep 12, 2017
- JSR Corporation
- Hiromu Miyata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and resist pattern-forming method
- Patent number 9,268,219
- Issue date Feb 23, 2016
- JSR Corporation
- Hiromu Miyata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method
- Patent number 9,229,323
- Issue date Jan 5, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,223,207
- Issue date Dec 29, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
- Patent number 9,046,765
- Issue date Jun 2, 2015
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method
- Patent number 8,822,140
- Issue date Sep 2, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern
- Patent number 8,530,146
- Issue date Sep 10, 2013
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,124,314
- Issue date Feb 28, 2012
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...
- Publication number 20240319596
- Publication date Sep 26, 2024
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20190146340
- Publication date May 16, 2019
- JSR Corporation
- Motohiro SHIRATANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20150093703
- Publication date Apr 2, 2015
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140363766
- Publication date Dec 11, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140255854
- Publication date Sep 11, 2014
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
- Publication number 20140023968
- Publication date Jan 23, 2014
- JSR Corporation
- Hiromitsu NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20130337385
- Publication date Dec 19, 2013
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20130323653
- Publication date Dec 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130316287
- Publication date Nov 28, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130295506
- Publication date Nov 7, 2013
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130095428
- Publication date Apr 18, 2013
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20130089817
- Publication date Apr 11, 2013
- JSR Corporation
- Hiromu MIYATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120202150
- Publication date Aug 9, 2012
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATERN FORMING METHOD
- Publication number 20120164586
- Publication date Jun 28, 2012
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100221664
- Publication date Sep 2, 2010
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100203452
- Publication date Aug 12, 2010
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiromu MIYATA

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition and resist pattern-forming me...

Photoresist composition and resist pattern-forming method

Pattern-forming method

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, resist pattern-forming radiation-sen...

Resist pattern-forming method

Method for forming resist pattern

Radiation-sensitive composition

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...

NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD

PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RADIATION-SENSITIVE RESIN COMPOSITION

PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION

PATERN FORMING METHOD

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION