Hiromu SAKAMOTO

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition
- Patent number 11,561,471
- Issue date Jan 24, 2023
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 11,119,408
- Issue date Sep 14, 2021
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,838,300
- Issue date Nov 17, 2020
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, resin, resist composition and method for producing resist pat...
- Patent number 9,809,669
- Issue date Nov 7, 2017
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 9,726,976
- Issue date Aug 8, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, photoresist composition, and method for produ...
- Patent number 9,580,402
- Issue date Feb 28, 2017
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,429,841
- Issue date Aug 30, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator and resist composition
- Patent number 9,405,187
- Issue date Aug 2, 2016
- Sumitomo Chemical Company, Limited
- Takashi Hiraoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 9,233,945
- Issue date Jan 12, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,993,210
- Issue date Mar 31, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,906,589
- Issue date Dec 9, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,835,095
- Issue date Sep 16, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,778,594
- Issue date Jul 15, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 8,753,795
- Issue date Jun 17, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition
- Patent number 8,753,796
- Issue date Jun 17, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,663,899
- Issue date Mar 4, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,557,500
- Issue date Oct 15, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,367,298
- Issue date Feb 5, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,318,404
- Issue date Nov 27, 2012
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,625,689
- Issue date Dec 1, 2009
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound
- Patent number 7,612,217
- Issue date Nov 3, 2009
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20180065925
- Publication date Mar 8, 2018
- Sumitomo Chemical Company, Limited
- Hiromu SAKAMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20180031969
- Publication date Feb 1, 2018
- Sumitomo Chemical Company, Limited
- Hiromu SAKAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20170168393
- Publication date Jun 15, 2017
- Sumitomo Chemical Company, Limited
- Masako SUGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODU...
- Publication number 20160200702
- Publication date Jul 14, 2016
- Sumitomo Chemical Company, Limited
- Hiromu SAKAMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PAT...
- Publication number 20160145205
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Hiromu SAKAMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20130095424
- Publication date Apr 18, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022915
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022925
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022918
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120264055
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120251945
- Publication date Oct 4, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120225385
- Publication date Sep 6, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219905
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR AND RESIST COMPOSITION
- Publication number 20110318688
- Publication date Dec 29, 2011
- Takashi HIRAOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110200936
- Publication date Aug 18, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20110200940
- Publication date Aug 18, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110065041
- Publication date Mar 17, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110014568
- Publication date Jan 20, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100316952
- Publication date Dec 16, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Sulfonium compound
- Publication number 20080081925
- Publication date Apr 3, 2008
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20060160017
- Publication date Jul 20, 2006
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C07 - ORGANIC CHEMISTRY

Hiromu SAKAMOTO

Person

Patents Grantslast 30 patents

Photoresist composition

Compound, resin and photoresist composition

Salt and photoresist composition containing the same

Salt, resin, resist composition and method for producing resist pat...

Photoresist composition

Salt, acid generator, photoresist composition, and method for produ...

Resist composition and method for producing resist pattern

Salt, acid generator and resist composition

Compound, resin and photoresist composition

Salt and photoresist composition containing the same

Salt and photoresist composition comprising the same

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition

Photoresist composition

Resist composition and method for producing resist pattern

Salt and photoresist composition comprising the same

Salt and photoresist composition containing the same

Salt and photoresist composition containing the same

Chemically amplified positive resist composition

Sulfonium compound

Patents Applicationslast 30 patents

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODU...

SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PAT...

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT, ACID GENERATOR AND RESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

PHOTORESIST COMPOSITION

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Sulfonium compound

Chemically amplified positive resist composition