Hironori OKA

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,044,967
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive composition for EUV light, pattern forming method, a...
- Patent number 11,703,758
- Issue date Jul 18, 2023
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition for EUV light, pattern forming method, a...
- Patent number 11,604,414
- Issue date Mar 14, 2023
- FUJIFILM Corporation
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20230087940
- Publication date Mar 23, 2023
- FUJIFILM CORPORATION
- Hironori OKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20220334476
- Publication date Oct 20, 2022
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...
- Publication number 20220179307
- Publication date Jun 9, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20220082938
- Publication date Mar 17, 2022
- FUJIFILM CORPORATION
- Aina USHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20210011377
- Publication date Jan 14, 2021
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
- Publication number 20200401045
- Publication date Dec 24, 2020
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20200050106
- Publication date Feb 13, 2020
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hironori OKA

Person

Patents Grantslast 30 patents

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive composition for EUV light, pattern forming method, a...

Photosensitive composition for EUV light, pattern forming method, a...

Patents Applicationslast 30 patents

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...

ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...