Hironori SATOH

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 12,032,293
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 11,675,268
- Issue date Jun 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,686
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film composition, patterning process, and method...
- Patent number 10,416,563
- Issue date Sep 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240402606
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal Oxide Film, Patterning Process, And M...
- Publication number 20240153771
- Publication date May 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20230168585
- Publication date Jun 1, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20230152695
- Publication date May 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori SATOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20220107566
- Publication date Apr 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20200363723
- Publication date Nov 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20200356007
- Publication date Nov 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20190258160
- Publication date Aug 22, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD...
- Publication number 20180284614
- Publication date Oct 4, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hironori SATOH
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hironori SATOH

Person

Patents Grantslast 30 patents

Composition for forming organic film, patterning process, and polymer

Composition for forming organic film, patterning process, and polymer

Resist composition and patterning process

Resist underlayer film composition, patterning process, and method...

Patents Applicationslast 30 patents

Composition For Forming Resist Underlayer Film And Patterning Process

Composition For Forming Metal Oxide Film, Patterning Process, And M...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD...