Hiroshi Fujita

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method and a s...
- Patent number 11,929,250
- Issue date Mar 12, 2024
- Kioxia Corporation
- Katsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 11,682,568
- Issue date Jun 20, 2023
- Kioxia Corporation
- Satoshi Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 11,610,789
- Issue date Mar 21, 2023
- Kioxia Corporation
- Katsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device
- Patent number 11,469,127
- Issue date Oct 11, 2022
- Kioxia Corporation
- Shigeru Kinoshita
- B08 - CLEANING
Information Patent Grant
Processing apparatus and method
- Patent number 8,517,035
- Issue date Aug 27, 2013
- Kabushiki Kaisha Toshiba
- Takahiko Wakatsuki
- B08 - CLEANING
Information Patent Grant
Apparatus and method for photoresist removal processing
- Patent number 8,141,567
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Takahiko Wakatsuki
- B08 - CLEANING
Information Patent Grant
Ultrasonic cleaning apparatus
- Patent number 7,814,919
- Issue date Oct 19, 2010
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Grant
Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...
- Patent number 6,875,696
- Issue date Apr 5, 2005
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,368,977
- Issue date Apr 9, 2002
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method using electrostatic chuck...
- Patent number 6,333,246
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow rate control valve and flow rate control system
- Patent number 6,230,738
- Issue date May 15, 2001
- Tokyo Keiso Co., Ltd.
- Yasushi Watanabe
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Cleaning method
- Patent number 6,082,373
- Issue date Jul 4, 2000
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Grant
Electrolytic cell for producing acidic water and alkaline water
- Patent number 5,980,703
- Issue date Nov 9, 1999
- Permelec Electrode Ltd.
- Kuniaki Yamada
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUBSTRATE PROCESSING, AN...
- Publication number 20240429075
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Ryo ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTU...
- Publication number 20240297146
- Publication date Sep 5, 2024
- KIOXIA Corporation
- Shota KONUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...
- Publication number 20240087918
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230307265
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Takaumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230301079
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Naomi Yanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND A S...
- Publication number 20230089765
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Katsuhiro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...
- Publication number 20220406626
- Publication date Dec 22, 2022
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...
- Publication number 20220310401
- Publication date Sep 29, 2022
- KIOXIA Corporation
- Hakuba KITAGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...
- Publication number 20220068673
- Publication date Mar 3, 2022
- KIOXIA Corporation
- Satoshi NAKAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20210280438
- Publication date Sep 9, 2021
- KIOXIA Corporation
- Katsuhiro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE
- Publication number 20210082728
- Publication date Mar 18, 2021
- Kioxia Corporation
- Shigeru Kinoshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCT...
- Publication number 20090165819
- Publication date Jul 2, 2009
- Kabushiki Kaisha Toshiba
- Naoya HAYAMIZU
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR MANUFACTURING MICROSTRUCTURE
- Publication number 20090084754
- Publication date Apr 2, 2009
- Kabushiki Kaisha Toshiba
- Naoya HAYAMIZU
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING APPARATUS
- Publication number 20090044844
- Publication date Feb 19, 2009
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
ULTRASONIC-WAVE WASHING UNIT, ULTRASONIC-WAVE WASHING APPARATUS, UL...
- Publication number 20090044829
- Publication date Feb 19, 2009
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING OXIDE FILM AND METHOD OF MANUFACTURING SEMI...
- Publication number 20080214019
- Publication date Sep 4, 2008
- Kabushiki Kaisha Toshiba
- Hiroshi Katsumata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...
- Publication number 20080110473
- Publication date May 15, 2008
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
ULTRASONIC CLEANING APPARATUS
- Publication number 20080029132
- Publication date Feb 7, 2008
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING
- Publication number 20070277853
- Publication date Dec 6, 2007
- Kabushiki Kaisha Toshiba
- Takahiko Wakatsuki
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND METHOD
- Publication number 20070256711
- Publication date Nov 8, 2007
- Toshihide HAYASHI
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING
- Publication number 20070246085
- Publication date Oct 25, 2007
- Kabushiki Kaisha Toshiba
- Takahiko Wakatsuki
- B08 - CLEANING
Information Patent Application
PROCESSING APPARATUS AND METHOD
- Publication number 20070246097
- Publication date Oct 25, 2007
- Kabushiki Kaisha Toshiba
- Takahiko Wakatsuki
- B08 - CLEANING
Information Patent Application
Cleaning method and cleaning apparatus
- Publication number 20060249182
- Publication date Nov 9, 2006
- Naoya Hayamizu
- B08 - CLEANING
Information Patent Application
Method of manufacturing oxide film and method of manufacturing semi...
- Publication number 20060068605
- Publication date Mar 30, 2006
- Kabushiki Kaisha Toshiba
- Hiroshi Katsumata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultrasonic cleaning apparatus
- Publication number 20050284509
- Publication date Dec 29, 2005
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...
- Publication number 20050145264
- Publication date Jul 7, 2005
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING
Information Patent Application
Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...
- Publication number 20040200500
- Publication date Oct 14, 2004
- Kabushiki Kaisha Toshiba
- Naoaki Sakurai
- B08 - CLEANING

Hiroshi Fujita

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method and a s...

Substrate treatment apparatus and manufacturing method of semicondu...

Semiconductor manufacturing apparatus and method of manufacturing s...

Substrate processing device

Processing apparatus and method

Apparatus and method for photoresist removal processing

Ultrasonic cleaning apparatus

Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...

Semiconductor device manufacturing method

Semiconductor device manufacturing method using electrostatic chuck...

Flow rate control valve and flow rate control system

Cleaning method

Electrolytic cell for producing acidic water and alkaline water

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUBSTRATE PROCESSING, AN...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTU...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND A S...

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...

CHEMICAL SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEM...

SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDU...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

SUBSTRATE PROCESSING DEVICE

METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCT...

METHOD AND SYSTEM FOR MANUFACTURING MICROSTRUCTURE

ULTRASONIC CLEANING APPARATUS

ULTRASONIC-WAVE WASHING UNIT, ULTRASONIC-WAVE WASHING APPARATUS, UL...

METHOD OF MANUFACTURING OXIDE FILM AND METHOD OF MANUFACTURING SEMI...

Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...

ULTRASONIC CLEANING APPARATUS

APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING

SUBSTRATE CLEANING APPARATUS AND METHOD

APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING

PROCESSING APPARATUS AND METHOD

Cleaning method and cleaning apparatus

Method of manufacturing oxide film and method of manufacturing semi...

Ultrasonic cleaning apparatus

Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...

Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ul...