Hiroshi HANEKAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,124,164
- Issue date Oct 22, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 12,038,685
- Issue date Jul 16, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,032,280
- Issue date Jul 9, 2024
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,982,935
- Issue date May 14, 2024
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank for EUV lithography and substrate with conduc...
- Patent number 11,934,093
- Issue date Mar 19, 2024
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,914,283
- Issue date Feb 27, 2024
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,703,751
- Issue date Jul 18, 2023
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,698,580
- Issue date Jul 11, 2023
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,150,550
- Issue date Oct 19, 2021
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,036,127
- Issue date Jun 15, 2021
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective film, reflective member, and method for producing protec...
- Patent number 10,634,887
- Issue date Apr 28, 2020
- AGC Inc.
- Naoko Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing glass substrate and glass substrate
- Patent number 10,239,783
- Issue date Mar 26, 2019
- AGC Inc.
- Hiroshi Hanekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank and process for producing the reflective mask...
- Patent number 10,241,390
- Issue date Mar 26, 2019
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma source for a plasma CVD apparatus and a manufacturing method...
- Patent number 10,204,767
- Issue date Feb 12, 2019
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating film-equipped glass substrate, and method for producing coa...
- Patent number 9,988,303
- Issue date Jun 5, 2018
- Asahi Glass Company, Limited
- Hiroshi Hanekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank and process for producing the reflective mask...
- Patent number 9,927,693
- Issue date Mar 27, 2018
- Asahi Glass Company, Limited
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma source for a plasma CVD apparatus and a manufacturing method...
- Patent number 9,922,805
- Issue date Mar 20, 2018
- Asahi Glass Company, Limited
- Hirotomo Kawahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20250004360
- Publication date Jan 2, 2025
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240241433
- Publication date Jul 18, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20240201576
- Publication date Jun 20, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
- Publication number 20240184191
- Publication date Jun 6, 2024
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240176225
- Publication date May 30, 2024
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20240160097
- Publication date May 16, 2024
- AGC Inc.
- Hiroshi HANEKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
- Publication number 20230350284
- Publication date Nov 2, 2023
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20230305383
- Publication date Sep 28, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220236636
- Publication date Jul 28, 2022
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20220075256
- Publication date Mar 10, 2022
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20210397077
- Publication date Dec 23, 2021
- AGC Inc.
- Hiroshi HANEKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20210325772
- Publication date Oct 21, 2021
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20190056653
- Publication date Feb 21, 2019
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20190049836
- Publication date Feb 14, 2019
- AGC Inc.
- Hiroshi HANEKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD...
- Publication number 20180158655
- Publication date Jun 7, 2018
- ASAHI GLASS COMPANY, LIMITED
- Hirotomo Kawahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE
- Publication number 20180044229
- Publication date Feb 15, 2018
- ASAHI GLASS COMPANY, LIMITED
- Hiroshi HANEKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CVD APPARATUS
- Publication number 20170283952
- Publication date Oct 5, 2017
- Asahi Glass Company, Limited
- Hirotomo KAWAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK...
- Publication number 20170242330
- Publication date Aug 24, 2017
- Asahi Glass Company, Limited
- Hiroshi HANEKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK...
- Publication number 20170082916
- Publication date Mar 23, 2017
- Asahi Glass Company, Limited
- Hiroshi HANEKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING FILM-EQUIPPED GLASS SUBSTRATE, AND METHOD FOR PRODUCING COA...
- Publication number 20170036948
- Publication date Feb 9, 2017
- Asahi Glass Company, Limited
- Hiroshi HANEKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROTECTIVE FILM, REFLECTIVE MEMBER, AND METHOD FOR PRODUCING PROTEC...
- Publication number 20160077320
- Publication date Mar 17, 2016
- ASAHI GLASS COMPANY, LIMITED
- Naoko OKADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD...
- Publication number 20150235814
- Publication date Aug 20, 2015
- ASAHI GLASS COMPANY, LIMITED
- Hirotomo Kawahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE
- Publication number 20150103399
- Publication date Apr 16, 2015
- ASAHI GLASS COMPANY, LIMITED
- Hiroshi HANEKAWA
- G02 - OPTICS

Hiroshi HANEKAWA

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Reflective mask blank for EUV lithography

Reflective mask blank, reflective mask, and method for manufacturin...

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography and substrate with conduc...

Reflective mask blank and reflective mask

Reflective mask blank and reflective mask

Reflective mask blank for EUV lithography

Reflective mask blank and reflective mask

Reflective mask blank and reflective mask

Protective film, reflective member, and method for producing protec...

Method of producing glass substrate and glass substrate

Reflective mask blank and process for producing the reflective mask...

Plasma source for a plasma CVD apparatus and a manufacturing method...

Coating film-equipped glass substrate, and method for producing coa...

Reflective mask blank and process for producing the reflective mask...

Plasma source for a plasma CVD apparatus and a manufacturing method...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD...

METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE

PLASMA CVD APPARATUS

REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK...

REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK...

COATING FILM-EQUIPPED GLASS SUBSTRATE, AND METHOD FOR PRODUCING COA...

PROTECTIVE FILM, REFLECTIVE MEMBER, AND METHOD FOR PRODUCING PROTEC...

PLASMA SOURCE FOR A PLASMA CVD APPARATUS AND A MANUFACTURING METHOD...

METHOD OF PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE