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Hiroshi Iizuka
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Shanghai, CN
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma reactor having a function of tuning low frequency RF power d...
Patent number
11,830,747
Issue date
Nov 28, 2023
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
Kui Zhao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Switchable matching network and an inductively coupled plasma proce...
Patent number
10,685,811
Issue date
Jun 16, 2020
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
Kui Zhao
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
High frequency power supply device and high frequency power supplyi...
Patent number
10,201,069
Issue date
Feb 5, 2019
Pearl Kogyo Co., Ltd.
Eiich Hayano
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
Patent number
7,503,996
Issue date
Mar 17, 2009
Advanced Micro-Fabrication Equipment, Inc. Asia
Jinyuan Chen
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Temperature Control Apparatus for Semiconductor Processing Equipmen...
Publication number
20200211873
Publication date
Jul 2, 2020
Advanced Micro-Fabrication Equipment Inc. China
Kui Zhao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SWITCHABLE MATCHING NETWORK AND AN INDUCTIVELY COUPLED PLASMA PROCE...
Publication number
20200090908
Publication date
Mar 19, 2020
Advanced Micro-Fabrication Equipment Inc. China
Kui Zhao
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...
Publication number
20190206703
Publication date
Jul 4, 2019
Advanced Micro-Fabrication Equipment Inc, China
Kui ZHAO
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...
Publication number
20150289355
Publication date
Oct 8, 2015
PEARL KOGYO CO., LTD.
Eiich Hayano
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...
Publication number
20080251207
Publication date
Oct 16, 2008
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA,
Jinyuan Chen
H03 - BASIC ELECTRONIC CIRCUITRY