Hiroshi Ito

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 9,250,529
- Issue date Feb 2, 2016
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,821,978
- Issue date Sep 2, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for using a topcoat composition
- Patent number 8,802,357
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic vinyl ether based reverse-tone step and flash imprint lith...
- Patent number 8,759,415
- Issue date Jun 24, 2014
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Stabilization of vinyl ether materials
- Patent number 8,637,602
- Issue date Jan 28, 2014
- International Business Machines Corporation
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Methods for forming surface features using self-assembling masks
- Patent number 8,529,779
- Issue date Sep 10, 2013
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Bilayer systems including a polydimethylglutarimide-based bottom la...
- Patent number 8,323,868
- Issue date Dec 4, 2012
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic vinyl ether based reverse-tone step and flash imprint lith...
- Patent number 8,262,961
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 8,236,482
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processes and materials for step and flash imprint lithography
- Patent number 8,128,832
- Issue date Mar 6, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Topcoat composition
- Patent number 8,088,873
- Issue date Jan 3, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using a topcoat composition
- Patent number 8,053,537
- Issue date Nov 8, 2011
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of use in high index immersion...
- Patent number 8,003,309
- Issue date Aug 23, 2011
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calixarene blended molecular glass photoresists and processes of use
- Patent number 7,993,812
- Issue date Aug 9, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...
- Patent number 7,947,425
- Issue date May 24, 2011
- International Business Machines Corporation
- Richard A. DiPietro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Forming surface features using self-assembling masks
- Patent number 7,828,986
- Issue date Nov 9, 2010
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Release layer for imprinted photocationic curable resins
- Patent number 7,749,422
- Issue date Jul 6, 2010
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Topcoat compositions and methods of use thereof
- Patent number 7,728,089
- Issue date Jun 1, 2010
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling the differential dissolution rate of photores...
- Patent number 7,608,382
- Issue date Oct 27, 2009
- Promerus LLC
- Larry F. Rhodes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Stabilization of vinyl ether materials
- Patent number 7,488,771
- Issue date Feb 10, 2009
- International Business Machines Corporation
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Copolymer for use in chemical amplification resists
- Patent number 7,479,364
- Issue date Jan 20, 2009
- International Business Machines Corporation
- Hiroshi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Preparation of topcoat compositions and methods of use thereof
- Patent number 7,473,749
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...
- Patent number 7,465,837
- Issue date Dec 16, 2008
- International Business Machines Corporation
- Richard A. DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Processes and materials for step and flash imprint lithography
- Patent number 7,419,611
- Issue date Sep 2, 2008
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Topcoat compositions and methods of use thereof
- Patent number 7,358,035
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer for use in chemical amplification resists
- Patent number 7,358,027
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Hiroshi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of controlling the differential dissolution rate of photores...
- Patent number 7,341,816
- Issue date Mar 11, 2008
- Promerus, LLC
- Larry F. Rhodes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...
- Patent number 7,150,957
- Issue date Dec 19, 2006
- International Business Machines Corporation
- Richard A. DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,964,840
- Issue date Nov 15, 2005
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,800,414
- Issue date Oct 5, 2004
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
STABILIZATION OF VINYL ETHER MATERIALS
- Publication number 20140110888
- Publication date Apr 24, 2014
- International Business Machines Corporation
- Frances A. Houle
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20120291668
- Publication date Nov 22, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION...
- Publication number 20120288797
- Publication date Nov 15, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING A TOPCOAT COMPOSITION
- Publication number 20120082945
- Publication date Apr 5, 2012
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147983
- Publication date Jun 23, 2011
- Joy CHENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LA...
- Publication number 20110111339
- Publication date May 12, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calixarene Blended Molecular Glass Photoresists and Processes of Use
- Publication number 20110020756
- Publication date Jan 27, 2011
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF USE
- Publication number 20100203450
- Publication date Aug 12, 2010
- International Business Machines Corporation
- Masaki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist Compositions and Methods of Use in High Index Immersion...
- Publication number 20090181321
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist Compositions and Methods of Use in High Index Immersion...
- Publication number 20090181322
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING A TOPCOAT COMPOSITION
- Publication number 20090142714
- Publication date Jun 4, 2009
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITION
- Publication number 20090136871
- Publication date May 28, 2009
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS
- Publication number 20090107953
- Publication date Apr 30, 2009
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS
- Publication number 20090107950
- Publication date Apr 30, 2009
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
STABILIZATION OF VINYL ETHER MATERIALS
- Publication number 20090092767
- Publication date Apr 9, 2009
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS
- Publication number 20080248213
- Publication date Oct 9, 2008
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Application
RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS
- Publication number 20080241418
- Publication date Oct 2, 2008
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20080174051
- Publication date Jul 24, 2008
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY
- Publication number 20080169268
- Publication date Jul 17, 2008
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Application
TOPCOAT COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20080145787
- Publication date Jun 19, 2008
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of controlling the differential dissolution rate of photores...
- Publication number 20080124651
- Publication date May 29, 2008
- International Business Machines Corporation
- Larry F. Rhodes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer For Use In Chemical Amplification Resists
- Publication number 20080085473
- Publication date Apr 10, 2008
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20070298176
- Publication date Dec 27, 2007
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Stabilization of vinyl ether materials
- Publication number 20070066750
- Publication date Mar 22, 2007
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Processes and materials for step and flash imprint lithography
- Publication number 20070051697
- Publication date Mar 8, 2007
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Application
Preparation of topcoat compositions and methods of use thereof
- Publication number 20060292484
- Publication date Dec 28, 2006
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topcoat compositions and methods of use thereof
- Publication number 20060292485
- Publication date Dec 28, 2006
- Hiroshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...
- Publication number 20060287558
- Publication date Dec 21, 2006
- International Business Machines
- Richard A. DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...
- Publication number 20060275701
- Publication date Dec 7, 2006
- International Business Machines
- Richard A. DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20040241580
- Publication date Dec 2, 2004
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroshi Ito

Person

Patents Grantslast 30 patents

Photoresist compositions and methods of use in high index immersion...

Methods of directed self-assembly and layered structures formed the...

Method for using a topcoat composition

Aromatic vinyl ether based reverse-tone step and flash imprint lith...

Stabilization of vinyl ether materials

Methods for forming surface features using self-assembling masks

Bilayer systems including a polydimethylglutarimide-based bottom la...

Aromatic vinyl ether based reverse-tone step and flash imprint lith...

Photoresist compositions and methods of use in high index immersion...

Processes and materials for step and flash imprint lithography

Topcoat composition

Method for using a topcoat composition

Photoresist compositions and methods of use in high index immersion...

Calixarene blended molecular glass photoresists and processes of use

Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...

Forming surface features using self-assembling masks

Release layer for imprinted photocationic curable resins

Topcoat compositions and methods of use thereof

Method of controlling the differential dissolution rate of photores...

Stabilization of vinyl ether materials

Copolymer for use in chemical amplification resists

Preparation of topcoat compositions and methods of use thereof

Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...

Processes and materials for step and flash imprint lithography

Topcoat compositions and methods of use thereof

Copolymer for use in chemical amplification resists

Method of controlling the differential dissolution rate of photores...

Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

STABILIZATION OF VINYL ETHER MATERIALS

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION...

METHOD FOR USING A TOPCOAT COMPOSITION

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LA...

Calixarene Blended Molecular Glass Photoresists and Processes of Use

PHOTORESIST COMPOSITIONS AND METHODS OF USE

Photoresist Compositions and Methods of Use in High Index Immersion...

Photoresist Compositions and Methods of Use in High Index Immersion...

METHOD FOR USING A TOPCOAT COMPOSITION

TOPCOAT COMPOSITION

METHODS FOR FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS

FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS

STABILIZATION OF VINYL ETHER MATERIALS

RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS

RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY

TOPCOAT COMPOSITIONS AND METHODS OF USE THEREOF

Method of controlling the differential dissolution rate of photores...

Copolymer For Use In Chemical Amplification Resists

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

Stabilization of vinyl ether materials

Processes and materials for step and flash imprint lithography

Preparation of topcoat compositions and methods of use thereof

Topcoat compositions and methods of use thereof

Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...

Fluorinated vinyl ethers, copolymers thereof, and use in lithograph...

Radiation-sensitive resin composition