Hiroshi Kubota

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Nakakubiki-gun, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,771,893
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 6,746,817
- Issue date Jun 8, 2004
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20070020534
- Publication date Jan 25, 2007
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20020081521
- Publication date Jun 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...